Lam Research

Concept Two Dual Sequel

Deposition Lam Research Concept Two family

Research Quality: 20% complete

LinkedIn X Email

Concept Two Dual Sequel — Inventory photo — Fig. 01Concept Two Dual SequelInventory photo^[1]

Power

208 V^[5]

Gas delivery

NSRTBD, Gas Box Config^[3]

What is it?

What do the numbers mean?

Power & electrical3

Voltage: 208 V^[5]; 50/60 Hz^[5]
Phase: 3 Phase^[5]

Wafer handling2

Wafer Substrate: Silicon^[3]
Wafer Cassette: Entegris FA 200-8 MT 7902^[3]

Gas & chemistry1

NSRTBD, Gas Box Config^[3]

Accurate?

Control & software3

Software Version & Build: Sequel 4.94 B 38^[3]
User Interface Option: SMIF Ready^[3]
User Interface Options: Cleanroom (Right Side)^[3]

Configuration & options15

RPC (2)^[3]
Flat Type: Semi Notched^[3]
DLVM Mfg Type: Refurb - SSEMVIT^[3]
PM 2 (Left): Sequel^[3]
PM 2 (Left) Mfg Type: Refurb - SSEMVIT^[3]
PM 3 (Center): Sequel^[3]
PM 3 (Center) Mfg Type: Refurb - SSEMVIT^[3]
PM 4 (Right): Blank-Off^[3]
Cable Length: 75 ft^[3]; DLCM:^[3]
Front End Option: SMIF Ready^[3]
Paddle and Arc Kits: STD^[3]
Cool Station Options: 4 Shelf Cool Station^[3]
Particle Check Options: Particle Sensor Manifold^[3]
QTY: 3 Systems (Single shrink chamber and dual standard chamber)^[4]

Interested in this tool?

Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

ConfigurationNSRTBD, Gas Box Config^[3]
Voltage208 V^[5]
Configuration50/60 Hz^[5]
Phase3 Phase^[5]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the Concept Two Dual Sequel are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Concept Two Dual Sequel are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Concept Two Dual Sequel are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Concept Two Dual Sequel are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Concept Two Dual Sequel are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Concept Two Dual Sequel is not on record.
Answerable by: an OEM datasheet or a fab qualification report