Lam Research Concept Two

Models in this family

1. 

   Concept Two
2. 

   Concept Two Dual Sequel
3. 

   Concept Two Sequel

   The Lam / Novellus Concept Two Sequel is a PECVD (plasma-enhanced chemical vapor deposition) system for 8-inch wafers.

4. 

   Concept Two Sequel Express

   Lam / Novellus Concept Two Sequel Express is a deposition chamber described as an installed chamber with room for a second chamber.

5. 

   Concept Two Speed
6. 

   Concept Two Speed NExT

   Lam / Novellus Concept Two Speed NExT is a CVD (Chemical Vapor Deposition) system for 8-inch wafers.

7. 

   Concept Two Speed S (A)

   The Lam / Novellus Concept Two Speed S (A) is a chamber-only etch tool.