Lam Research Concept Two

Models in this family

1. 

   Concept Two

   Lam Research Concept Two is a deposition tool family that includes PECVD and CVD configurations.

2. 

   Concept Two Dual Sequel

   The Lam Research (Novellus) Concept Two Dual Sequel is a chemical vapor deposition (CVD) system.

3. 

   Concept Two Sequel

   The Lam / Novellus Concept Two Sequel is a PECVD (plasma-enhanced chemical vapor deposition) system for 8-inch wafers.

4. 

   Concept Two Sequel Express

   Lam / Novellus Concept Two Sequel Express is a deposition chamber described as an installed chamber with room for a second chamber.

5. 

   Concept Two Speed

   The Lam Research Concept Two Speed is an etch chamber used in semiconductor manufacturing.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Concept Two Speed S (A)	—	2010–2010	Listed as a chamber-only configuration with 208 VAC, 3 phase, 50/60 Hz, 21 A full load current, 25 A main breaker rating, and 8 A largest load.	waferpedia.com[1]

6. 

   Concept Two Speed NExT

   Lam / Novellus Concept Two Speed NExT is a CVD (Chemical Vapor Deposition) system for 8-inch wafers.

7. 

   Concept Two Speed S (A)

   The Lam / Novellus Concept Two Speed S (A) is a chamber-only etch tool.

Sources