Lam Research
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The Lam Research Gasonics PEP 4800 DL Iridia is an etcher. The Lam Research Gasonics PEP 4800 DL Iridia is a dual-chamber tool.[1][2]

An etcher removes material from a wafer by controlled exposure to a reactive process environment. An etcher in semiconductor manufacturing uses that controlled removal to pattern films after lithography has defined the areas to be processed.
A dual-chamber etcher provides two process chambers within one tool platform. A dual-chamber architecture supports sequential or parallel processing while keeping the etch function centralized in a single equipment frame.
An etcher sits in the pattern-transfer portion of the wafer fabrication flow. An etcher follows lithographic definition of features and precedes later cleaning, inspection, or deposition steps that occur after material removal.
The Lam Research Gasonics PEP 4800 DL Iridia serves semiconductor etch processing. An etcher of this class is used for material removal in pattern transfer on processed wafers.
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The following facts about the Gasonics PEP 4800 DL Iridia are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics PEP 4800 DL Iridia are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gasonics PEP 4800 DL Iridia are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gasonics PEP 4800 DL Iridia are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gasonics PEP 4800 DL Iridia are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gasonics PEP 4800 DL Iridia is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 13, 2026.
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.