MKS

660

Deposition 6-inch diameter stage MKS 660 family

Research Quality: 30% complete

LinkedIn X Email

MKS660

No photo available yet

Wafer size

6-inch diameter stage

Power

2 RF power supplies^[1]

Vacuum

cryo and turbo pumped to 1 x 10^7 Torr^[1]

Optics

from a few nm to hundreds of nm^[1]

What is it?

Source material identifies the MKS 660 as a sputter deposition system used for metals, alloys, and insulating thin films. It is described as user configurable, with film thickness controllable from a few nm to hundreds of nm, and includes a 6-inch diameter stage, co-sputter capability, reactive sputtering, substrate rotation, and substrate heating up to 200 C.

What can it run?

Process applications and technology nodes documented for this tool.

sputter deposition of metals, alloys, and insulating thin films
liftoff deposition
co-sputtering
reactive sputtering

What do the numbers mean?

Power & electrical2

power supplies: 2 RF power supplies^[1]
DC power supply: switchable DC power supply^[1]

Vacuum & pumping2

vacuum system: cryo and turbo pumped to 1 x 10^7 Torr^[1]
argon pressure range: 3-15 mT controllable with 200 sccm MFC controller^[1]

Wafer handling2

substrate rotation: +/- 10% uniformity^[1]
substrate heating: up to 200 C^[1]

Optics & imaging1

film thickness range: from a few nm to hundreds of nm^[1]

Configuration & options6

process: sputter deposition of metals, alloys, and insulating thin films^[1]
cathodes: three 3-inch diameter confocal cathodes^[1]
co-sputter capability: yes^[1]
reactive sputtering: available (Nitrogen or Oxygen)^[1]
stage: 6-inch diameter stage^[1]
liftoff deposition: with sputter power^[1]

Interested in this tool?

Embed spec card

What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

Denton Vacuum Discovery 18— Same function class: Deposition, 6-inch diameter stageCompare in depthsource^[2]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

power supplies2 RF power supplies^[1]
DC power supplyswitchable DC power supply^[1]
vacuum systemcryo and turbo pumped to 1 x 10^7 Torr^[1]
argon pressure range3-15 mT controllable with 200 sccm MFC controller^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the 660 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 660 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 660 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 660 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 660 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 660 is not on record.
Answerable by: an OEM datasheet or a fab qualification report