Nikon

NSR SF 100 i-Line

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The Nikon NSR-SF100 is an i-line scan field stepper. The NSR-SF100 achieves resolutions of 0.4 microns or smaller with a 1:4 reduction ratio on an exposure field of 25 x 33 mm. The NSR-SF100 has a throughput of 120 or more wafers/hour for 200 mm wafers.^[1]^[2]

NSR SF 100 i-Line — Inventory photo — Fig. 01NSR SF 100 i-LineInventory photo^[1]

Performance

45nm or less (M + 3 sigma)^[1]

Optics

6" reticle^[1]

What it is

The Nikon NSR SF 100 uses i-line exposure at a wavelength of 365 nm and a 1:4 reduction ratio.^[1]^[2]

How it works

General reference — not yet source-verified

A lithography stepper projects a patterned reticle image onto a photoresist-coated wafer through reduction optics.

Where it fits in the process flow

General reference — not yet source-verified

A lithography stepper sits in the front end of wafer patterning, after resist coating and before etch or deposition transfer steps.

Applications

General reference — not yet source-verified

An i-line stepper is used for semiconductor patterning tasks that require optical exposure at mercury i-line wavelength.

What do the numbers mean?

Wafer handling4

Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately)^[1]
Throughput (200 mm wafer): 120 wafers/hour or more^[2]
Wafer sizes: 8 inch^[1]
Throughput (300 mm wafer): 80 wafers/hour (approximately)^[1]

Optics & imaging7

6" reticle^[1]
Resolution: 0.4um or less^[1]
Exposed light source: i-line (wavelength = 365nm)^[1]
Exposure range: 25x33mm^[1]
Resolution: 0.4 μm or less^[2]
Exposure field: 25 x 33 mm^[2]
Numerical aperture (N.A.): 0.5^[1]

Performance1

Alignment accuracy: 45nm or less (M + 3 sigma)^[1]

Configuration & options4

N.A.: 0.5^[1]
Reduction ratio: 1:4^[2]; Refurbished system^[1]
300 mm configuration: Field-upgradable to a fully compliant 300 mm configuration^[2]

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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What exposure wavelength does the Nikon NSR SF 100 use?

The Nikon NSR SF 100 uses i-line exposure at a wavelength of 365 nm.^[1]

What reduction ratio does the Nikon NSR SF 100 use?

The Nikon NSR SF 100 uses a 1:4 reduction ratio.^[1]^[2]

Not publicly documented

The following facts about the NSR SF 100 i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR SF 100 i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR SF 100 i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR SF 100 i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR SF 100 i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR SF 100 i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report