Nikon
Scanner 204 B
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Nikon Scanner 204 B is a lithography stepper manufactured by Nikon. The Nikon Scanner 204 B supports 6-inch and 8-inch wafers. The Nikon Scanner 204 B is specified at 0.15 µm.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedA lithography stepper exposes photoresist in a repeated sequence of alignment and projection exposures across a wafer.
A stepper in this class uses a mask or reticle, precision wafer positioning, and optical reduction to transfer circuit patterns onto the resist-coated wafer.
Where it fits in the process flow
General reference — not yet source-verifiedA lithography stepper sits in the pattern-definition stage of semiconductor manufacturing.
The Nikon Scanner 204 B is used before downstream etch or deposition pattern transfer steps that follow resist patterning.
Applications
General reference — not yet source-verifiedThe Nikon Scanner 204 B is used for semiconductor photolithography on silicon wafers.
What do the numbers mean?
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Scanner 204 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Scanner 204 B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Scanner 204 B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Scanner 204 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Scanner 204 B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Scanner 204 B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]Equipment inventory listing
- [3]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 7, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
