OAI
The OAI 800 is a backside aligner used for photolithography.[1]

The OAI 800 is a mask aligner designed for backside alignment.[1]
In a backside aligner, the mask is aligned to features on the back side of a substrate, often using transmitted-light or infrared microscopy to see through the substrate. The substrate is typically held in a chuck and brought into contact or proximity with the mask, then exposed to ultraviolet light through the mask. The OAI 800, as a backside aligner, follows this general principle.
Process applications and technology nodes documented for this tool.
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The following facts about the 800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 800 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 800 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 800 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 800 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 800 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Oct 3, 2026.
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