Oxford Instruments
Ionfab 300 Plus
What it is
General reference — not yet source-verifiedIn semiconductor and microfabrication settings, this class of tool removes material by directing an ion beam at a specimen. It is used for controlled etching and, in some configurations, deposition or process monitoring alongside those functions.
How it works
The system uses an ion source to generate an inert argon beam for milling or etching. One installed configuration uses automatic load-lock transfer for single substrates, clamping rings to hold the substrate in the process chamber, and water-cooled holders with backside helium cooling available.[2][3]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Cranky Valve
- Defect Pressure Gauge
What do the numbers mean?
Vacuum & pumping1
Wafer handling3
Optics & imaging1
- End Point Detector based on mass spectrometer[2]
Control & software1
- Control system, motors, and end-point-detection are operational[2]
Configuration & options7
Vintage & configurations
- 1994Owner-stated production year[1]
One source states the system as '1994 Oxford Ionfab 300 Plus Ion Beam etching/deposition system.'
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Few ConstraintsCranky Valve, Defect Pressure Gauge[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What endpoint method is used in one configured system?
One configuration uses SIMS endpoint detection.[3]
Not publicly documented
The following facts about the Ionfab 300 Plus are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the Ionfab 300 Plus are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Ionfab 300 Plus are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Ionfab 300 Plus is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Ionfab 300 Plus are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Ionfab 300 Plus are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (7)Every fact above is drawn from these public sources
- [1]semistarcorp.com — semistarcorp.comsemistarcorp.com
- [2]Inventory photo
- [3]LIMS - [View Tool] — labbokning.mc2.chalmers.selabbokning.mc2.chalmers.se
- [4]Oxford instruments Ionfab 300 Plus Ion Beam etching & deposition system | SemiStar — semistarcorp.comsemistarcorp.com
- [5]OXFORD Ionfab 300 Plus Ion beam etch and deposition system, 4-8 | SemiStar — semistarcorp.comsemistarcorp.com
- [6]Etching: CAIBE System (Oxford Ionfab300Plus) - A*STAR Scientific Equipment & Services Finder (A*SEF) — search.rsc.a-star.edu.sgsearch.rsc.a-star.edu.sg
- [7]Compound Semiconductor: Oxford Instruments — oxinst.com (Jan 3, 2011)web.archive.org
Last updated Jul 29, 2026.
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