Oxford Instruments

Plate 01Video 1 Oxford Plasmalab 100 ICP System ID# 3589
Plate 02Oxford Plasmalab 100 ICP (ID# 4162)
Plate 03Oxford Plasmalab 100 ICP Etcher (ID# 3811)
Plate 04Oxford Plasmalab 100 ICP (ID# 3894)
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The following facts about the Plasmalab 100 ICP 180 RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab 100 ICP 180 RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab 100 ICP 180 RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Plasmalab 100 ICP 180 RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Plasmalab 100 ICP 180 RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Plasmalab 100 ICP 180 RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Jul 29, 2026.