Oxford Instruments Plasmalab 100

Models in this family

1. 

   Plasmalab 100

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   System 100 PECVD / FlexAL ALD (thermal/plasma) cluster system	—	—	Described as a cluster comprised of a FlexAL ALD system and a PlasmaLab 100 PECVD system sharing a common loadlock.	uwaterloo.ca[1]

2. 

   Plasmalab 100 ICP 180
3. 

   Plasmalab 100 ICP 180 RIE
4. 

   Plasmalab 100 ICP 380

   The Oxford Plasmalab 100 ICP 380 is an etcher, as stated in the product listing.

5. 

   Plasmalab 100 ICP-RIE

   The Oxford Plasmalab 100 ICP-RIE is an inductively coupled plasma reactive ion etch system.

6. 

   Plasmalab 100 Plus RIE

   Oxford Instruments Plasmalab 100 Plus RIE is a reactive ion etcher with a load-locked system and a gas module set up for Ar, O2, Cl2, and SiCl4.

7. 

   Plasmalab 100 RIE

   The Oxford Plasmalab 100 RIE is a reactive ion etching platform for dielectric etching, MEMS, and R&D applications.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Plasmalab 100 Plus	—	—	Allows small batch processing for R&D and Pilot Production; supports up to 8''/200 mm wafers; load-locked system	classoneequipment.com[2]
   Plasmalab 100 RIE (FL)	—	—	Configured for SiO2 plasma etching; supports wafer sizes up to 300 mm; 330 mm platen; water-cooled electrode; Advanced Energy RFX 600A RF generator; Alcatel turbo pump; blue PLC control	semistarcorp.com[3]

Sources