Oxford Instruments

Plasmalab 100 RIE

Etch Oxford Instruments Plasmalab 100 family

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Plasmalab 100 RIE — Inventory photo — Fig. 01Plasmalab 100 RIEInventory photo^[1]

Plate 01Oxford Plasmalab System 100 RIE ,Reactive Ion Etch System semiconductor equipment
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Plate 02Oxford Plasmalab System 100 Reactive Ion Etch (RIE) #56082
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Power

208V, 50/60Hz^[1]

Vacuum

With VAT PM-5 Adaptive Pressure Controller^[1]

Gas delivery

Gas Box^[1]

What it is

The Oxford Instruments Plasmalab 100 is a reactive ion etcher (RIE). The Oxford Instruments Plasmalab 100 is manufactured by Oxford Instruments Plasma Technology.^[1]^[4]^[6]^[5]

The system is configured for semiconductor plasma etching applications including research and development, pilot production, and MEMS fabrication.^[4]^[5]

How it works

The Plasmalab 100 RIE employs a 13.56 MHz RF generator with up to 600 W of power. The system has a water-cooled electrode that maintains a temperature range of 10°C to 80°C. The chamber is evacuated by a turbo pump backed by a dry mechanical pump.^[5]

Where it fits in the process flow

The Plasmalab 100 RIE is configured as a load-locked system suitable for small batch processing in R&D and pilot production environments.^[4]

Applications

The Plasmalab 100 RIE is configured for SiO2 and dielectric plasma etching applications. The system is suitable for MEMS process development, advanced semiconductor plasma processing, and University R&D cleanroom applications.^[5]

What do the numbers mean?

Power & electrical2

Voltage: 208V, 50/60Hz^[1]
RF Generator: Advanced Energy RFX 600A, 600 W @ 13.56 MHz^[5]

Vacuum & pumping7

With VAT PM-5 Adaptive Pressure Controller^[1]; Adixen ACT 1300M Turbopump Controller^[1]; Leybold D65BCS Vacuum Pump with Oil Filter & Exhaust Filter^[1]
Turbo Pump: Alcatel ATH 400M^[5]
Turbo Pump Controller: Alcatel ACT 600M^[5]
Pressure Controller: VAT PM-5 Adaptive Pressure Controller^[1]
Vacuum Pump: Leybold D65BCS Vacuum Pump with oil filter and exhaust filter^[1]

Wafer handling3

Wafer Size: 6 inch^[1]
Wafer Size: Up to 8 inch / 200 mm^[4]
Wafer Size: Up to 300 mm^[5]

Gas & chemistry3

Gas Box^[1]
Number of Gas Lines: 6 (with MFCs)^[5]
Installed Gases: Ar, N2, CHF3, NF3, N2O^[5]

Control & software2

Control Computer (no HDD)^[1]
Control System: Windows PC with user-friendly interface and blue PLC control architecture^[5]

Configuration & options8

Includes:^[1]; Thermo Neslab RTE7 Chiller^[1]; OptiTemp OTI-5WL-P3-216 Chiller^[1]; LCD Monitor^[1]
Electrode Temperature Range: 10°C to 80°C^[5]
Chiller: Thermo Neslab RTE7 Chiller and OptiTemp OTI-5WL-P3-216 Chiller^[1]
Platen Size: 330 mm platen^[5]
Load-locked: Yes^[4]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
Plasmalab 100 Plus	—	—	Allows small batch processing for R&D and Pilot Production; supports up to 8''/200 mm wafers; load-locked system	classoneequipment.com^[4]
Plasmalab 100 RIE (FL)	—	—	Configured for SiO2 plasma etching; supports wafer sizes up to 300 mm; 330 mm platen; water-cooled electrode; Advanced Energy RFX 600A RF generator; Alcatel turbo pump; blue PLC control	semistarcorp.com^[5]

Interested in this tool?

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Voltage208V, 50/60Hz^[1]
ConfigurationWith VAT PM-5 Adaptive Pressure Controller^[1]
ConfigurationAdixen ACT 1300M Turbopump Controller^[1]
ConfigurationLeybold D65BCS Vacuum Pump with Oil Filter & Exhaust Filter^[1]
ConfigurationGas Box^[1]
RF GeneratorAdvanced Energy RFX 600A, 600 W @ 13.56 MHz^[5]
Turbo PumpAlcatel ATH 400M^[5]
Turbo Pump ControllerAlcatel ACT 600M^[5]
Pressure ControllerVAT PM-5 Adaptive Pressure Controller^[1]
Number of Gas Lines6 (with MFCs)^[5]
Installed GasesAr, N2, CHF3, NF3, N2O^[5]
Vacuum PumpLeybold D65BCS Vacuum Pump with oil filter and exhaust filter^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What RF power and frequency does it use?

One configuration uses an Advanced Energy RFX 600A generator providing 600 W at 13.56 MHz.^[5]

What is the electrode temperature range?

The water-cooled electrode can be controlled from 10°C to 80°C.^[5]

What gases can be used?

Configurations include gas modules for Ar, O2, Cl2, SiCl4 and for Ar, N2, CHF3, NF3, N2O.^[4]^[5]

Not publicly documented

The following facts about the Plasmalab 100 RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab 100 RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Plasmalab 100 RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Plasmalab 100 RIE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Plasmalab 100 RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Plasmalab 100 RIE are on record.
Answerable by: an OEM parts catalog or a service engineer