Oxford Instruments
Plasmalab 80 uP RIE
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Oxford Instruments Plasmalab 80 uP RIE is a reactive ion etcher. The Oxford Instruments Plasmalab 80 uP RIE includes a vacuum pump. The Oxford Instruments Plasmalab 80 uP RIE was mainly used for O2 plasma processing.[1][2]
What it is
The Oxford Instruments Plasmalab 80 uP RIE is a reactive ion etcher. The Oxford Instruments Plasmalab 80 uP RIE is part of the Plasmalab 80 family.[2]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedReactive ion etchers are typically used after a masking layer has been defined by lithography and before later cleaning, resist stripping, deposition, or inspection steps. Reactive ion etchers serve where a patterned opening must be transferred into a film or surface with dry plasma processing rather than wet chemical etching.
Applications
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Slit valve sometimes does not fully open when venting back to atmosphere after a run
What do the numbers mean?
Vacuum & pumping2
- Includes vacuum pump[1]
Configuration & options5
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Plasmalab 80 uP RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab 80 uP RIE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab 80 uP RIE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Plasmalab 80 uP RIE are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the Plasmalab 80 uP RIE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Plasmalab 80 uP RIE are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 16, 2026.
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