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Oxford Instruments

Plasmalab 800 Plus RIE

EtchOxford Instruments Plasmalab 800 family
Research Quality: 30% complete
Plasmalab 800 Plus RIE — Inventory photo
Fig. 01Plasmalab 800 Plus RIEInventory photo[1]

Power

Advanced Energy RFX 600A RF supply[1]

Vacuum

Leybold TMP-361C turbopump[1]

What is it?

The Oxford Instruments Plasmalab 800 Plus RIE is a reactive ion etching system described with a PC controller, four gas mass flow controllers, and a 460 mm diameter electrode.

What do the numbers mean?

Power & electrical1

Advanced Energy RFX 600A RF supply[1]
Accurate?

Vacuum & pumping3

Leybold Harris Turbotronik NT20 turbopump controller[1]
Accurate?
Leybold TMP-361C turbopump[1]
Accurate?
Busch Cobra BA100 vacuum pump[1]
Accurate?

Control & software1

Advanced Energy TCM tuner controller[1]
Accurate?

Configuration & options2

LEP Tungsten[1]
Accurate?
Elkay R2-10 recirculating chiller[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationAdvanced Energy RFX 600A RF supply[1]
  • ConfigurationLeybold Harris Turbotronik NT20 turbopump controller[1]
  • ConfigurationLeybold TMP-361C turbopump[1]
  • ConfigurationBusch Cobra BA100 vacuum pump[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the Plasmalab 800 Plus RIE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab 800 Plus RIE are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab 800 Plus RIE are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Plasmalab 800 Plus RIE are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Plasmalab 800 Plus RIE are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Plasmalab 800 Plus RIE is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]Inventory photo
  3. [3]Inventory photo
  4. [4]Oxford Plasmalab 800 RIE Reactive Ion Etch System | SemiStarsemistarcorp.comsemistarcorp.com
  5. [5]Oxford Instruments Plasmalab 800 Plus RIE Reactive Ion Etching System - SemiStar Corp. | SemiStarsemistarcorp.comsemistarcorp.com
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Last updated Jul 29, 2026.

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