Oxford Instruments
Plasmalab80
Plate 01Oxford Instruments Plasmalab 80+ DPCVD semiconductor equipment
SemiStarWatch on YouTubePlate 02Oxford PlasmaLab 80 Plus RIE PECVD Semiconductor equipment ~8 inch
SemiStarWatch on YouTubePlate 03Plasmalab 80 Plus RIE
Bid ServicellcWatch on YouTubePlate 04Oxford Plasmalab 80 Plus PECVD System (ID# 3908)
ClassOneEngineeringWatch on YouTube
Wafer size
up to 8-inch diameter wafers
Power
300 W RF and 300 W ICP[1]
Vacuum
Bosch (gas chopping) or cryo processes[1]
What is it?
What can it run?
Process applications and technology nodes documented for this tool.
- Plasma etching
- Material growth
- Cleanroom nanofabrication
- Nano and micro fabrication
What do the numbers mean?
Power & electrical1
Vacuum & pumping2
Wafer handling2
Gas & chemistry1
- Available gases
- N2, N2O, O2, SF6, Ar (max flow 100 sccm); C4F8, SiH4, CH4 (max flow 20 sccm)[1]
Configuration & options3
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Plasmalab80 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Plasmalab80 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Plasmalab80 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Plasmalab80 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Plasmalab80 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Plasmalab80 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]tmi.utexas.edu — tmi.utexas.edutmi.utexas.edu
Last updated Jul 29, 2026.
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