Plasma-Therm
Versaline
What it is
General reference — not yet source-verifiedHow it works
General reference — not yet source-verifiedPlasma-enhanced chemical vapor deposition uses plasma energy to activate precursor gases so that film-forming reactions occur at the substrate surface. In this class of tool, the plasma lowers the temperature needed for deposition compared with purely thermal chemical vapor deposition.
Applications
What do the numbers mean?
Control & software1
- Versaline Software[1]
Configuration & options8
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Versaline PECVD | — | — | Identified as Plasma-Enhanced Chemical Vapor Deposition. | Equipment inventory listing[3] |
| Versaline CVD | — | — | Listed as a CVD system with 3 Chamber Deposition, PCVD Versaline Chambers (x2), HDP-CVD Versaline Chamber, PM Modules (x3), Brooks MX 600, HDD, Versaline Software, and Manuals. | Equipment inventory listing[1] |
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- How to edit recipeDocumentucsb.edu
- CNS Consolidated RatesDocumentharvard.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Versaline are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Versaline are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Versaline are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Versaline are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Versaline is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Versaline are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (12)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]pnf.uchicago.edupnf.uchicago.edu
- [3]Equipment inventory listing
- [4]Capabilities | UD Nanofabrication Facility — udnf.udel.eduudnf.udel.edu
- [5]Plasma-Therm Deep Silicon Etcher | CNF Users — cnfusers.cornell.educnfusers.cornell.edu
- [6]Inductively Coupled Plasma Etching (ICP) | Stanford Nanofabrication Facility — snfguide.stanford.edusnfguide.stanford.edu
- [7]Plasma-Therm Versaline ICP RIE - Claire & John Bertucci Nanotechnology Laboratory - College of Engineering - Carnegie Me — nanofab.ece.cmu.edunanofab.ece.cmu.edu
- [8]Plasma-Therm Versaline PECVD OEI recipe development How-To - Equipment - nanoFAB Confluence — confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca
- [9]Tool Details - Harvard CNS — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
- [10]How to edit recipe — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [11]IBE – When to Use Ion Beam Etching — blog.plasmatherm.com (Dec 22, 2021)web.archive.org
- [12]Plasma-Therm: MEMS/NEMS — plasma-therm.com (May 28, 2021)web.archive.org
Last updated Jul 29, 2026.
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