Tool family
Plasma-Therm Versaline
Models in this family
Plasma-Therm Versaline is a deposition system. Machines of this class are used to form thin material films on prepared substrates for semiconductor and related precision-process applications.
Cited variants
Designation Generation Vintage Changes Source Versaline PECVD — — Identified as Plasma-Enhanced Chemical Vapor Deposition. Equipment inventory listing[1] Versaline CVD — — Listed as a CVD system with 3 Chamber Deposition, PCVD Versaline Chambers (x2), HDP-CVD Versaline Chamber, PM Modules (x3), Brooks MX 600, HDD, Versaline Software, and Manuals. Equipment inventory listing[2] The Plasma-Therm Versaline LACVD is an etch system for 6-inch wafers.
The Plasma-Therm Versaline VCX 600 ICP is a 6-inch inductively coupled plasma etch system.
All entries
- VersalinePlasma-Therm
General referencePlasma-Therm Versaline is a deposition system. Machines of this class are used to form thin material films on prepared substrates for semiconductor and related precision-process applications.
CategoryDeposition9 specs - Versaline LACVDPlasma-Therm
The Plasma-Therm Versaline LACVD is an etch system for 6-inch wafers.
CategoryEtch20 specs - Versaline VCX 600 ICPPlasma-Therm
The Plasma-Therm Versaline VCX 600 ICP is a 6-inch inductively coupled plasma etch system.
CategoryEtch7 specs - Versaline VLN ICPPlasma-ThermCategoryEtchWaferBrooks TM (Transfer Module) with four Wafer Manual Load Lock16 specs
Sources
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Equipment inventory listing