Plasma-Therm
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The Plasma-Therm Versaline Deep Silicon Etch is a plasma etching system designed for deep silicon etching.[1]
Deep silicon etching in systems of this class typically employs a time-multiplexed process known as the Bosch process. The process alternates between an etch step that uses a fluorine-based plasma to isotropically etch silicon and a passivation step that deposits a protective polymer layer on the sidewalls. The alternating cycles produce vertical sidewalls with high anisotropy.
Deep silicon etching is typically performed after lithographic patterning of a mask layer on the silicon wafer. The mask material is often photoresist, silicon dioxide, or silicon nitride, which must withstand the etch plasma. The etched wafer then proceeds to cleaning steps to remove residual mask and passivation layers.
The primary application of deep silicon etching is in MEMS manufacturing, where it is used to create structures such as accelerometers, gyroscopes, pressure sensors, and micro-mirrors. The high aspect ratios achievable allow for compact device designs.
Another major application is the formation of through-silicon vias for advanced packaging and three-dimensional integrated circuits. The etch process creates holes that are later filled with conductive material to provide vertical electrical connections through the silicon substrate.
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The following facts about the Versaline Deep Silicon are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the Versaline Deep Silicon are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Versaline Deep Silicon are on record.
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No publicly documented variants, configuration options, or revision breakpoints of the Versaline Deep Silicon are on record.
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The control-system platform and OS era of the Versaline Deep Silicon are not on record.
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No publicly documented failure modes or field errata for the Versaline Deep Silicon are on record.
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Last updated Sep 1, 2026.