Plasma-Therm
The Plasma-Therm Versaline VCX 600 is an inductively coupled plasma (ICP) etching system. The Versaline VCX 600 is configured for 6-inch wafer processing. The Versaline VCX 600 includes an ENI MKS GMW25 source generator, chillers, transformer, and pumps.[1][2]

An ICP etch system is a plasma processing tool used to remove selected material from a wafer surface. An ICP etch system belongs to the pattern transfer part of microfabrication, where plasma chemistry and ion bombardment are combined to shape features defined by a mask.
The Plasma-Therm Versaline VCX 600 ICP is an inductively coupled plasma etching system.[1][2][3]
A plasma etch tool sits after a masking or lithography step and before later cleaning and downstream integration steps. A plasma etch tool transfers the masked pattern into underlying films by removing material where the wafer is exposed.
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The following facts about the Versaline VCX 600 ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Versaline VCX 600 ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Versaline VCX 600 ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Versaline VCX 600 ICP are not on record.
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No publicly documented failure modes or field errata for the Versaline VCX 600 ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Versaline VCX 600 ICP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 20, 2026.
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