SUSS MicroTec
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| HP8 TT | — | — | Table top hot plate for wafer from Ø 2'' up to 200 mm or substrates up to 6'' x 6''; includes 3 lifting pins, temperature range 60 - 250 °C, uniformity +/-0.5 °C up to 120 °C and +/-1 % for 120 °C and above, touchpanel controller, and programmable temperature ramps. | equipx.net[2] |
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the HP 8 Hot Plate are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the HP 8 Hot Plate are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the HP 8 Hot Plate are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the HP 8 Hot Plate are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the HP 8 Hot Plate are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the HP 8 Hot Plate is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Jul 29, 2026.