SUSS MicroTec
MA 150 M EL MA Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedMask aligners operate by positioning a wafer under a mask, aligning substrate marks to mask features, and exposing the resist-coated surface so the mask pattern is printed into the photoresist. Mask aligners generally combine wafer handling, optical viewing for alignment, mask holding, substrate positioning, and an exposure system in one tool.
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners sit in the lithography portion of a microfabrication flow after photoresist coating and before resist development. Mask aligners are used when a process layer needs patterned exposure, after which the developed resist commonly serves as the image for etching, deposition patterning, plating, implantation masking, or lift-off preparation.
Applications
General reference — not yet source-verifiedMask aligners are used for patterned photoresist exposure on wafers and other substrates in semiconductor, microsystem, and related fabrication work. Mask aligners are commonly applied to contact formation, interconnect definition, dielectric patterning, mesa or trench patterning, lift-off masks, bond pad openings, and assorted process-monitor structures.
What do the numbers mean?
Vintage & configurations
- 1993Vintage year[1]
1993 Vintage as stated in source
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 150 M EL MA Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the MA 150 M EL MA Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 150 M EL MA Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 150 M EL MA Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 150 M EL MA Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 150 M EL MA Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 16, 2026.
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