SUSS MicroTec
MA 200 CC Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The SUSS MicroTec MA 200 CC Mask Aligner is a mask aligner used in photolithography.[3][1]
How it works
General reference — not yet source-verifiedA mask aligner transfers a pattern from a photomask to a photosensitive layer by bringing the mask and substrate into alignment and exposing the coated surface to light. The machine supports contact-style lithographic pattern transfer used in microfabrication.
Where it fits in the process flow
General reference — not yet source-verifiedThe machine sits in the lithography portion of the process flow, where patterned exposure defines features on a photoresist-coated substrate before later etch or deposition steps use that pattern.
Applications
General reference — not yet source-verifiedMask aligners are used for patterning photoresist in semiconductor and microfabrication workflows, including processing of wafers and other planar substrates that require optical pattern transfer.
What do the numbers mean?
Control & software1
- With HDD & Software[1]
Configuration & options1
- Only lamp light instead of UV LED Light[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 200 CC Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the MA 200 CC Mask are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 CC Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 CC Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 CC Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 CC Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
Last updated Jul 29, 2026.
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