SUSS MicroTec
MA 200 CC Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The SUSS MicroTec MA 200 CC Mask is a mask aligner used in lithography. The MA 200 CC belongs to the SUSS MicroTec MA 200 family.[3]
How it works
General reference — not yet source-verifiedMask aligners transfer a pattern from a photomask to a photosensitive layer by bringing the mask and substrate into alignment and exposing the coated surface to light. Mask aligners support contact-style lithographic pattern transfer used in microfabrication.
Where it fits in the process flow
General reference — not yet source-verifiedMask aligners sit in the lithography portion of a process flow. Mask aligners expose photoresist-coated substrates before later pattern transfer steps use the resist image.
Applications
General reference — not yet source-verifiedMask aligners are used for patterning photoresist in semiconductor and microfabrication workflows. Mask aligners are used on wafers and other planar substrates that require optical pattern transfer.
What do the numbers mean?
Optics & imaging1
Control & software1
- With HDD & Software[3]
Configuration & options4
- Only lamp light instead of UV LED Light[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 200 CC Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 CC Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 CC Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 CC Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 CC Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 200 CC Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]waferpedia.com — waferpedia.comwaferpedia.com
- [4]Equipment inventory listing
Last updated Oct 21, 2026.
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