SUSS MicroTec
MA 8 Mask
What it is
General reference — not yet source-verifiedThe SUSS MA 8 Mask Aligner is a photolithography aligner used for optical pattern transfer in semiconductor processing. It is part of the contact alignment class of lithography tools used for device patterning on wafers.
How it works
General reference — not yet source-verifiedA mask aligner positions a photomask close to a wafer and uses ultraviolet exposure to transfer a pattern into photoresist. Alignment optics and mechanical stages are used to register the mask to existing wafer features before exposure.
Where it fits in the process flow
The Berkeley NanoLab lithography capability list places the Karl Suss MA8 Mask Aligner within its lithography tools for device patterning, alongside other exposure systems and resist coat, develop, and lift-off resources.[5]
Applications
General reference — not yet source-verifiedMask aligners are used for contact and proximity photolithography in microfabrication, especially for patterning features on wafers during process development, prototyping, and device fabrication.
What do the numbers mean?
Optics & imaging1
- The optical sensor is for 405nm and 365nm[1]
Configuration & options5
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Gen 2 | Gen 2 | — | Described as a SUSS MA 8 Mask Aligner Gen 2; one source says it includes TSA and BSA. | Equipment inventory listing[4] |
| Gen 4 | Gen 4 | — | Described as a SUSS MA 8 Mask Aligner Gen 4; one source says it is equipped for TSA 2018 Vintage. | Equipment inventory listing[3] |
| MA 8 Mask Aligner - Gen 2 - with TSA & BSA | Gen 2 | — | Stated as Gen 2 with TSA and BSA. | Equipment inventory listing[4] |
| MA 8 Mask Aligner - Gen 4 - Equipped for TSA 2018 Vintage | Gen 4 | 2018 | Stated as Gen 4 and equipped for TSA 2018 vintage. | Equipment inventory listing[3] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the MA 8 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 8 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MA 8 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 8 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 8 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MA 8 Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]inventory listing
- [4]inventory listing
- [5]Lithography — nanolab.berkeley.edunanolab.berkeley.edu
Last updated Jul 29, 2026.
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