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Temescal

CV-6SXL

Deposition5"Temescal CV-6SXL family
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TemescalCV-6SXL
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Wafer size

5"

Power

10 kV[1]

Vacuum

CHA Auto-Tech II[1]

Gas delivery

For maintaining oxide stoichiometry[1]

What it is

The Temescal CV-6SXL is a vacuum deposition tool used as an electron-beam evaporation system.[1]

Its detailed specifications list a Temescal CV-6SXL 10 kV power supply, a Temescal 4-pocket Series 260 E-Beam turret source, a Temescal TemEbeam Controller, an Inficon IC/5 Thin Film Deposition Controller, and a cryo-pumped system.[1]

How it works

The system evaporates thin films from solid sources by electron-beam evaporation. A crystal thickness monitor is used to control deposition thickness.[1]

The TemEbeam Controller controls the high-voltage power supply, electron beam position, with up to eight sweep patterns per pocket, and source pocket position. Automatic vacuum sequencing is provided via CHA Auto-Tech II.[1]

Oxygen gas can be bled into the system during deposition to try to maintain stoichiometry, and heated substrate fixturing can be used. The heated sample holder is programmable and supports sample temperatures up to 370°C.[1]

Where it fits in the process flow

Samples up to about 5 inches in diameter can be placed into the system for evaporation. The specifications also distinguish between up to 5-inch diameter non-heated samples and 4-inch diameter heated samples.[1]

The deposited dielectrics are typically used for optical coatings, electrical insulators, and reactive ion etching masks.[1]

Applications

The system is used for controlled deposition of thin dielectric films. The most common dielectrics deposited are SiO2, ITO, TiO2, Ta2O5, and SrF2.[1]

Other materials may also be evaporated upon request, and the listed recipes characterize materials for this machine.[1]

  • Controlled deposition of thin dielectric films
  • Optical coatings (anti-reflective)
  • Electrical insulators
  • Reactive ion etching masks

What do the numbers mean?

Power & electrical1

Power supply
10 kV[1]
Accurate?

Vacuum & pumping2

Vacuum system
Cryo-pumped system with low E-7 ultimate base pressure[1]
Accurate?
Automatic vacuum sequencing
CHA Auto-Tech II[1]
Accurate?

Gas & chemistry1

Oxygen gas MFC
For maintaining oxide stoichiometry[1]
Accurate?

Control & software2

Controller
TemEbeam Controller (EBC)[1]
Accurate?
Deposition controller
Inficon IC/5 Thin Film Deposition Controller[1]
Accurate?

Configuration & options7

Manufacturer
Temescal[1]
Accurate?
Model
CV-6SXL[1]
Accurate?
Description
Electron-Beam Evaporation System[1]
Accurate?
E-beam source
4-pocket Series 260 E-Beam turret source[1]
Accurate?
Thickness monitoring
Crystal thickness monitoring[1]
Accurate?
Sample size
Up to 5" diameter non-heated; 4" diameter heated[1]
Accurate?
Heated sample holder
Programmable; sample temps up to 370°C[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Power supply10 kV[1]
  • Vacuum systemCryo-pumped system with low E-7 ultimate base pressure[1]
  • Automatic vacuum sequencingCHA Auto-Tech II[1]
  • Oxygen gas MFCFor maintaining oxide stoichiometry[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Frequently asked questions

What deposition method does the Temescal CV-6SXL use?

It is an electron-beam evaporation system used for vacuum deposition.[1]

What sample sizes can it handle?

Samples up to about 5 inches in diameter can be placed into the system for evaporation. The specifications also list up to 5-inch diameter non-heated samples and 4-inch diameter heated samples.[1]

Does the tool support heated deposition?

Yes. Heated substrate fixturing can be used, and the heated sample holder is programmable with sample temperatures up to 370°C.[1]

How is deposition thickness controlled?

A crystal thickness monitor is used to control the deposition thickness.[1]

Not publicly documented

The following facts about the CV-6SXL are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CV-6SXL are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the CV-6SXL are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the CV-6SXL are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the CV-6SXL are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the CV-6SXL is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
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Last updated Jul 26, 2026.

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