Temescal
Wafer size
5"
Power
10 kV[1]
Vacuum
CHA Auto-Tech II[1]
Gas delivery
For maintaining oxide stoichiometry[1]
The Temescal CV-6SXL is a vacuum deposition tool used as an electron-beam evaporation system.[1]
Its detailed specifications list a Temescal CV-6SXL 10 kV power supply, a Temescal 4-pocket Series 260 E-Beam turret source, a Temescal TemEbeam Controller, an Inficon IC/5 Thin Film Deposition Controller, and a cryo-pumped system.[1]
The system evaporates thin films from solid sources by electron-beam evaporation. A crystal thickness monitor is used to control deposition thickness.[1]
The TemEbeam Controller controls the high-voltage power supply, electron beam position, with up to eight sweep patterns per pocket, and source pocket position. Automatic vacuum sequencing is provided via CHA Auto-Tech II.[1]
Oxygen gas can be bled into the system during deposition to try to maintain stoichiometry, and heated substrate fixturing can be used. The heated sample holder is programmable and supports sample temperatures up to 370°C.[1]
Samples up to about 5 inches in diameter can be placed into the system for evaporation. The specifications also distinguish between up to 5-inch diameter non-heated samples and 4-inch diameter heated samples.[1]
The deposited dielectrics are typically used for optical coatings, electrical insulators, and reactive ion etching masks.[1]
The system is used for controlled deposition of thin dielectric films. The most common dielectrics deposited are SiO2, ITO, TiO2, Ta2O5, and SrF2.[1]
Other materials may also be evaporated upon request, and the listed recipes characterize materials for this machine.[1]
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It is an electron-beam evaporation system used for vacuum deposition.[1]
Samples up to about 5 inches in diameter can be placed into the system for evaporation. The specifications also list up to 5-inch diameter non-heated samples and 4-inch diameter heated samples.[1]
Yes. Heated substrate fixturing can be used, and the heated sample holder is programmable with sample temperatures up to 370°C.[1]
A crystal thickness monitor is used to control the deposition thickness.[1]
The following facts about the CV-6SXL are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the CV-6SXL are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the CV-6SXL are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the CV-6SXL are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the CV-6SXL are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the CV-6SXL is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Last updated Jul 26, 2026.
Temescal 4-pocket e-beam evaporation systems are used for vacuum deposition, including thin dielectric films and metal deposition.