Waferpedia

Temescal

FC-2800

DepositionTemescal FC-2800 family
Research Quality: 40% complete
FC-2800 — web.archive.org
Fig. 01FC-2800web.archive.org[1]

What is it?

The Temescal FC-2800 is described as a mid-sized coater for production and large-wafer R&D. It is a clean room-compatible, load-locked system with a 28-inch cubic product chamber, a standard 34-inch source-to-substrate distance, and an optional 42-inch distance with a source well extension collar.

What can it run?

Process applications and technology nodes documented for this tool.

  • Production
  • Large-wafer R&D
  • Lift-off

What do the numbers mean?

Vacuum & pumping1

Cryopumps
Product and source chamber cryopumps[1]
Accurate?

Wafer handling3

Use case
Mid-sized coater for production and large-wafer R&D[1]
Accurate?
Standard source-to-substrate distance
34 in[1]
Accurate?
Optional source-to-substrate distance
42 in with optional source well extension collar[1]
Accurate?

Control & software2

Control system
Temescal Control System (TCS) with Auto, Manual, and Service Modes plus process datalogging[1]
Accurate?
Deposition controller
Inficon XTC/3 deposition controller[1]
Accurate?

Dimensions & facilities1

Product chamber dimensions
28 in high x 28 in x 28 in; 28 in (711 mm) cubic[1]
Accurate?

Configuration & options4

Type
Deposition system[1]
Accurate?
Clean room compatibility
Clean room-compatible[1]
Accurate?
Load-lock status
Load-locked FC-2800[1]
Accurate?
Source trays
Support multiple e-beam and resistance sources[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
FC-2800Load-locked version; contrasted with the non-load-locked BCD-2800.web.archive.org[1]
BCD-2800Non-load-locked version; contrasted with the load-locked FC-2800.web.archive.org[1]
Interested in this tool?
Embed spec card

What replaced it?

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • CryopumpsProduct and source chamber cryopumps[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the FC-2800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FC-2800 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the FC-2800 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the FC-2800 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the FC-2800 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the FC-2800 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.orgweb.archive.org
  2. [2]Product Quickfinderweb.archive.orgweb.archive.org
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →