Tokyo Electron

Alpha 6 S

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Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

Alpha 6 S — Inventory photo — Fig. 01Alpha 6 SInventory photo^[2]

Vacuum

Gas in vacuum state chamber^[1]

Gas delivery

Chemical Vapor Deposition (CVD)^[2]

What it is

The Tokyo Electron Alpha 6 S is a chemical vapor deposition (CVD) system used in semiconductor manufacturing. The Alpha 6 S is designed for low-pressure silicon nitride (LP SIN) deposition on wafers. The Alpha 6 S processes wafers in a batch mode, with gases introduced into a vacuum state chamber.^[1]^[2]

What do the numbers mean?

Vacuum & pumping3

Gas in vacuum state chamber^[1]
Chamber type: Gas in vacuum state chamber^[1]
Deposited film: Low-pressure silicon nitride (LP SIN)^[2]

Wafer handling1

Wafer size: 8 inch^[2]

Gas & chemistry1

Process type: Chemical Vapor Deposition (CVD)^[2]

Configuration & options3

Batch processing^[1]; LP SIN^[2]
Processing type: Batch^[1]

Vintage & configurations

2000Vintage year (base model)^[1]
Equipment vintage year stated as 2000
2011Vintage year (CVD variant)^[2]
Equipment vintage year for CVD variant stated as 2011

Documented models & variants

Designation	Generation	Vintage	Changes	Source
Alpha 6 S CVD (Chemical Vapor Deposition)	—	2011	CVD version; source also states 8 inch and LP SIN 2011 vintage.	Equipment inventory listing^[2]
Alpha 6 S CVD	—	2011	Identified as Chemical Vapor Deposition (CVD); source states 8-inch wafer size and LP SIN 2011 vintage.	Equipment inventory listing^[2]

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

ConfigurationGas in vacuum state chamber^[1]
Chamber typeGas in vacuum state chamber^[1]
Process typeChemical Vapor Deposition (CVD)^[2]
Deposited filmLow-pressure silicon nitride (LP SIN)^[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the chamber environment during deposition on the Alpha 6 S?

The Alpha 6 S introduces gases into a vacuum state chamber.^[1]

Not publicly documented

The following facts about the Alpha 6 S are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

The control-system platform and OS era of the Alpha 6 S are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 6 S are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 6 S is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Alpha 6 S are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the Alpha 6 S are on record.
Answerable by: university cleanroom staff or an OEM application specialist