Tokyo Electron Alpha

Models in this family

1. 

   Alpha 6 S

   The Tokyo Electron Alpha 6 S is a batch processing deposition system introduced in 2000, with a variant configured for low-pressure silicon nitride CVD on 8-inch wafers.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   Alpha 6 S CVD (Chemical Vapor Deposition)	—	2011	CVD version; source also states 8 inch and LP SIN 2011 vintage.	Equipment inventory listing[1]
   Alpha 6 S CVD	—	2011	Identified as Chemical Vapor Deposition (CVD); source states 8-inch wafer size and LP SIN 2011 vintage.	Equipment inventory listing[1]

2. 

   Alpha 8 S

   The Tokyo Electron Alpha 8 S is an 8-inch semiconductor processing tool listed in multiple process configurations including BBR3 DOPE, WELL DRIVE HT FIELD OX, D2 ANNEAL, DENSIFICATION, and FSG ANNEAL.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   BBR3 DOPE	—	2010	Listed as a Tel Alpha 8 S configuration for 8-inch wafers.	Equipment inventory listing[2]
   WELL DRIVE HT FIELD OX	—	1997	Listed as a Tel Alpha 8 S configuration for 8-inch wafers.	Equipment inventory listing[3]
   D2 ANNEAL	—	1995	Listed as a Tel Alpha 8 S configuration for 8-inch wafers.	Equipment inventory listing[4]
   DENSIFICATION	—	1996	Listed as a Tel Alpha 8 S configuration for 8-inch wafers.	Equipment inventory listing[5]
   FSG ANNEAL	—	1996	Listed as a Tel Alpha 8 S configuration for 8-inch wafers.	Equipment inventory listing[6]

3. Alpha 8 S D Thermal Processing
4. Alpha 8 S D Wafer Processing Diffusion
5. 

   Alpha 8 S Vertical

   The Tokyo Electron Alpha 8 S is a vertical furnace for 8-inch wafers, configured for ATM Oxide processes.

6. 

   Alpha 8 S Z

   The Tokyo Electron Alpha 8 S Z is a furnace with 8-inch wafer size.

7. 

   Alpha 8 S Z LPCVD

   Tokyo Electron Alpha 8 S Z is a low pressure chemical vapor deposition (LPCVD) system.

8. Alpha 8 S ZC

   The Tokyo Electron Alpha 8 S ZC is a furnace for 8-inch wafers used for nitride processing.

9. 

   Alpha 8 SE

   The Tokyo Electron Alpha 8 SE is a furnace used for processes including high temperature oxide, D-poly, and undoped poly on 8-inch wafers.

10. 

    Alpha 8 SE D

    The Tokyo Electron Alpha 8 SE D is a 6-inch furnace used for high-temperature oxide processing.

11. 

    Alpha 8 SE E

    The Tokyo Electron Alpha 8 SE E is a vertical gas diffusion furnace for 8-inch wafers.

12. 

    Alpha 8 SE Vertical

    The Tokyo Electron Alpha 8 SE Vertical Furnace is a vertical furnace with 8-inch wafer capability.

    Cited variants

    Designation	Generation	Vintage	Changes	Source
    Alpha 8 SE Vertical Furnace, 8" TEOS	—	—	Product description states 8" TEOS.	Equipment inventory listing[7]
    Alpha 8 SE Vertical Furnace, 8" Poly	—	—	Product description states 8" Poly.	Equipment inventory listing[8]
    Alpha 8 SE Vertical Furnace, 8" Oxide	—	—	Product description states 8" Oxide.	Equipment inventory listing[9]
    Alpha 8 SE Vertical Furnace, 8" Nitride	—	—	Product description states 8" Nitride.	Equipment inventory listing[10]
    Alpha 8 SE Vertical Furnace, 8" Doped Poly	—	—	Product description states 8" Doped Poly.	Equipment inventory listing[11]

13. 

    Alpha 8 SE Z
14. 

    Alpha 8 SE Z Oxidation

    The Tokyo Electron Alpha 8 SE Z is an oxidation furnace configured for 8-inch wafers.

15. 

    Alpha 8 Vertical
16. 

    Alpha 801 D Vertical

    The Tokyo Electron Alpha 801 D vertical furnace processes 8-inch wafers and is configured for atmospheric oxide deposition.

17. Alpha 808 SCN
18. Alpha 85 Z

Sources