Tool family
The Tokyo Electron Alpha 6 S is a batch processing deposition system introduced in 2000, with a variant configured for low-pressure silicon nitride CVD on 8-inch wafers.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Alpha 6 S CVD (Chemical Vapor Deposition) | — | 2011 | CVD version; source also states 8 inch and LP SIN 2011 vintage. | Equipment inventory listing[1] |
| Alpha 6 S CVD | — | 2011 | Identified as Chemical Vapor Deposition (CVD); source states 8-inch wafer size and LP SIN 2011 vintage. | Equipment inventory listing[1] |
The Tokyo Electron Alpha 8 S is an 8-inch semiconductor processing tool listed in multiple process configurations including BBR3 DOPE, WELL DRIVE HT FIELD OX, D2 ANNEAL, DENSIFICATION, and FSG ANNEAL.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| BBR3 DOPE | — | 2010 | Listed as a Tel Alpha 8 S configuration for 8-inch wafers. | Equipment inventory listing[2] |
| WELL DRIVE HT FIELD OX | — | 1997 | Listed as a Tel Alpha 8 S configuration for 8-inch wafers. | Equipment inventory listing[3] |
| D2 ANNEAL | — | 1995 | Listed as a Tel Alpha 8 S configuration for 8-inch wafers. | Equipment inventory listing[4] |
| DENSIFICATION | — | 1996 | Listed as a Tel Alpha 8 S configuration for 8-inch wafers. | Equipment inventory listing[5] |
| FSG ANNEAL | — | 1996 | Listed as a Tel Alpha 8 S configuration for 8-inch wafers. | Equipment inventory listing[6] |
The Tokyo Electron Alpha 8 S D Wafer Processing Diffusion is a wafer processing diffusion furnace.
The Tokyo Electron Alpha 8 S is a vertical furnace for 8-inch wafers, configured for ATM Oxide processes.
The Tokyo Electron Alpha 8 S Z is a furnace with 8-inch wafer size.
Tokyo Electron Alpha 8 S Z is a low pressure chemical vapor deposition (LPCVD) system.
The Tokyo Electron Alpha 8 S ZC is a furnace for 8-inch wafers used for nitride processing.
The Tokyo Electron Alpha 8 SE is a furnace used for processes including high temperature oxide, D-poly, and undoped poly on 8-inch wafers.
The Tokyo Electron Alpha 8 SE D is a 6-inch furnace used for high-temperature oxide processing.
The Tokyo Electron Alpha 8 SE E is a vertical gas diffusion furnace for 8-inch wafers.
The Tokyo Electron Alpha 8 SE Vertical Furnace is a vertical furnace with 8-inch wafer capability.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Alpha 8 SE Vertical Furnace, 8" TEOS | — | — | Product description states 8" TEOS. | Equipment inventory listing[7] |
| Alpha 8 SE Vertical Furnace, 8" Poly | — | — | Product description states 8" Poly. | Equipment inventory listing[8] |
| Alpha 8 SE Vertical Furnace, 8" Oxide | — | — | Product description states 8" Oxide. | Equipment inventory listing[9] |
| Alpha 8 SE Vertical Furnace, 8" Nitride | — | — | Product description states 8" Nitride. | Equipment inventory listing[10] |
| Alpha 8 SE Vertical Furnace, 8" Doped Poly | — | — | Product description states 8" Doped Poly. | Equipment inventory listing[11] |
The Tokyo Electron Alpha 8 SE Z is an oxidation furnace configured for 8-inch wafers.
The Tokyo Electron Alpha 8 Vertical is a vertical furnace for thermal processing, supporting 200 mm wafers with an atmospheric oxide configuration.
The Tokyo Electron Alpha 801 D vertical furnace processes 8-inch wafers and is configured for atmospheric oxide deposition.
The Tokyo Electron Alpha 808 SCN is a thermal processing system in the diffusion class. Machines of this class are used to heat semiconductor wafers in tightly controlled atmospheres so that dopants, films, and interfaces can be formed or modified.
The Alpha 85 Z is a thermal/diffusion furnace manufactured by Tokyo Electron that processes 8-inch wafers and is configured for POCL3 processing.
The Tokyo Electron Alpha 6 S is a batch processing deposition system introduced in 2000, with a variant configured for low-pressure silicon nitride CVD on 8-inch wafers.
The Tokyo Electron Alpha 8 S is an 8-inch semiconductor processing tool listed in multiple process configurations including BBR3 DOPE, WELL DRIVE HT FIELD OX, D2 ANNEAL, DENSIFICATION, and FSG ANNEAL.
The Tokyo Electron Alpha 8 S D Wafer Processing Diffusion is a wafer processing diffusion furnace.
The Tokyo Electron Alpha 8 S is a vertical furnace for 8-inch wafers, configured for ATM Oxide processes.
The Tokyo Electron Alpha 8 S Z is a furnace with 8-inch wafer size.
Tokyo Electron Alpha 8 S Z is a low pressure chemical vapor deposition (LPCVD) system.
The Tokyo Electron Alpha 8 S ZC is a furnace for 8-inch wafers used for nitride processing.
The Tokyo Electron Alpha 8 SE is a furnace used for processes including high temperature oxide, D-poly, and undoped poly on 8-inch wafers.
The Tokyo Electron Alpha 8 SE D is a 6-inch furnace used for high-temperature oxide processing.
The Tokyo Electron Alpha 8 SE E is a vertical gas diffusion furnace for 8-inch wafers.
The Tokyo Electron Alpha 8 SE Vertical Furnace is a vertical furnace with 8-inch wafer capability.
The Tokyo Electron Alpha 8 SE Z is an oxidation furnace configured for 8-inch wafers.
The Tokyo Electron Alpha 8 Vertical is a vertical furnace for thermal processing, supporting 200 mm wafers with an atmospheric oxide configuration.
The Tokyo Electron Alpha 801 D vertical furnace processes 8-inch wafers and is configured for atmospheric oxide deposition.
General referenceThe Tokyo Electron Alpha 808 SCN is a thermal processing system in the diffusion class. Machines of this class are used to heat semiconductor wafers in tightly controlled atmospheres so that dopants, films, and interfaces can be formed or modified.
The Alpha 85 Z is a thermal/diffusion furnace manufactured by Tokyo Electron that processes 8-inch wafers and is configured for POCL3 processing.