Tokyo Electron
Telius Dry
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
General reference — not yet source-verifiedDry etchers remove material from a wafer surface using a plasma of reactive gases. The Telius is a dry etch system; the specific etch technology employed is not detailed in the available sources.
Where it fits in the process flow
General reference — not yet source-verifiedDry etching is a subtractive patterning step that follows photoresist development and precedes resist stripping. The Telius is used in the front-end-of-line or back-end-of-line processing to define features on the wafer.
What do the numbers mean?
Wafer handling2
Configuration & options5
- HDD[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the equipment?
It is a Tel Telius Dry Etcher with the model name Telius.[1]
Not publicly documented
The following facts about the Telius Dry are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Telius Dry are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Telius Dry are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Telius Dry are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Telius Dry are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Telius Dry is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]fabsurplus.com — fabsurplus.comfabsurplus.com
- [3]fabsurplus.com — fabsurplus.comfabsurplus.com
Last updated Aug 20, 2026.