Tokyo Electron
The Tokyo Electron Unity II E 855 PP is an etcher. The Tokyo Electron Unity II E 855 PP is a 2-chamber system. The Tokyo Electron Unity II E 855 PP uses CHF3/CF4/O2 gas.[1][2]

| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Unity II E 855 PP Dielectric | — | — | — | waferpedia.com[5] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The following facts about the Unity II E 855 PP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Unity II E 855 PP are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Unity II E 855 PP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Unity II E 855 PP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Unity II E 855 PP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Unity II E 855 PP are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Last updated Oct 17, 2026.
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.