Ulvac
SDP 570 VMS In Line
The Ulvac SDP 570 VMS In Line is a deposition sputtering system. The Ulvac SDP 570 VMS In Line uses DC magnetron sputtering. The Ulvac SDP 570 VMS In Line has a takt time of 2.5 minutes.[1][2]
Power
3 phase, 220 V, 60 Hz, 615 kVA[2]
Vacuum
Vacuum Conditions:[2]
Performance
2.5 min Film Thickness - 1100 Å[2]
What it is
The Ulvac SDP 570 VMS In Line is a deposition tool for sputtering. The Ulvac SDP 570 VMS In Line uses a direct-current magnetron sputtering method. The Ulvac SDP 570 VMS In Line is configured for manual substrate loading and a glass substrate material.[2][1]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedA sputtering deposition tool sits in the thin-film formation stage of a fabrication line. A sputtering tool usually follows substrate preparation and precedes later patterning or integration steps that use the deposited film.
Applications
General reference — not yet source-verifiedSputtering is used for conductive films, barrier films, and other thin-film layers in vacuum processing. Sputtering tools are used where controlled film thickness and uniform coverage are required.
What do the numbers mean?
Power & electrical1
Vacuum & pumping7
- Vacuum Conditions:[2]
- Preheat Chamber: ≤ 1 × 10⁻⁶ Torr - Sputtering Chamber: ≤ 1 × 10⁻⁶ Torr - Isolation Chamber: ≤ 1 × 10⁻⁶ Torr[2]
- Pump Down Time:[2]
- Preheat Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr - Removal Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr[2]
- Vacuum conditions
- Preheat Chamber: ≤ 1 × 10⁻⁶ Torr; Sputtering Chamber: ≤ 1 × 10⁻⁶ Torr; Isolation Chamber: ≤ 1 × 10⁻⁶ Torr[2]
- Pump down time
- Preheat Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr; Removal Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr[2]
Wafer handling3
Gas & chemistry2
- Required process gases
- Ar: 0.5 kg/cm²G, sccm; X: 0.5 kg/cm²G, sccm; Y: 0.5 kg/cm²G, sccm; Z: 0.5 kg/cm²G, sccm[2]
Optics & imaging1
Performance2
Dimensions & facilities3
Configuration & options15
- Elevator[2]
- Preparation Chamber[2]
- Isolation Room[2]
- Removal Chamber[2]
- Return Conveyor[2]
- Process Chamber:[2]
- Sputtering Chamber[2]
- Input Chamber -> Cathode Chamber -> Output Chamber[2]
- Sputtering Conditions:[2]
- Configuration elements
- Elevator; Preparation Chamber; Isolation Room; Removal Chamber; Return Conveyor[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Required Electric Power3 phase, 220 V, 60 Hz, 615 kVA[2]
- ConfigurationVacuum Conditions:[2]
- ConfigurationPreheat Chamber: ≤ 1 × 10⁻⁶ Torr - Sputtering Chamber: ≤ 1 × 10⁻⁶ Torr - Isolation Chamber: ≤ 1 × 10⁻⁶ Torr[2]
- ConfigurationPump Down Time:[2]
- ConfigurationPreheat Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr - Removal Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr[2]
- Vacuum conditionsPreheat Chamber: ≤ 1 × 10⁻⁶ Torr; Sputtering Chamber: ≤ 1 × 10⁻⁶ Torr; Isolation Chamber: ≤ 1 × 10⁻⁶ Torr[2]
- Pump down timePreheat Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr; Removal Chamber: Approx. 45 seconds from atmospheric pressure to 0.2 Torr[2]
- Sputtering pressure8 × 10⁻⁴ to 8 × 10⁻³ Torr[2]
- Required N2 gas0.5 kg/cm²G; Max: approx. 202 Nm³/hr; Normal: approx. 20.0 Nm³/hr[2]
- Required process gasesAr: 0.5 kg/cm²G, sccm; X: 0.5 kg/cm²G, sccm; Y: 0.5 kg/cm²G, sccm; Z: 0.5 kg/cm²G, sccm[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the SDP 570 VMS In Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SDP 570 VMS In Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SDP 570 VMS In Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SDP 570 VMS In Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SDP 570 VMS In Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the SDP 570 VMS In Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]SDP 570 VMS In Line — Ulvac | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [2]Inventory photo
Last updated Oct 10, 2026.
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