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Varian

Viision 80

Ion ImplantationVarian Viision 80 family
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Viision 80 — Inventory photo
Fig. 01Viision 80Inventory photo[1]

What it is

General reference — not yet source-verified

Ion implanters are semiconductor fabrication tools that introduce selected dopant ions into a wafer surface. Ion implantation is used to modify electrical properties in defined regions of semiconductor devices. Ion implanters are part of front end device fabrication where controlled dopant placement is required.

Where it fits in the process flow

General reference — not yet source-verified

Ion implantation is typically performed after patterned masking layers define where dopants should enter the wafer. Implanted wafers usually proceed to thermal treatment that activates dopants and repairs implant damage. Ion implanters sit within front end device fabrication because they establish electrically important regions before later device build steps are completed.

What do the numbers mean?

Power & electrical4

Voltage
208 V[1]
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Phase
3 Phase[1]
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Power
45 kW[1]
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Electrical
208 V, 3 Phase, 5 Wire[1]
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Wafer handling3

Wafer Sizes
8 inch[1]
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Wafer size
8 inch[1]
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Wafer size
200mm (8")[3]
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Configuration & options11

Medium Current[1]
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5 Wire[1]
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Make
Varian[1]
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Model
Viision 80[1]
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Category
Ion Implantation[2]
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Vintage
2000[1]
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OEM
Varian[1]
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Beam current class
Medium Current[2]
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Beam current class
High Current[3]
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Beam current
Up to 2000 µA[3]
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Energy range
12 to 300 keV[3]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Voltage208 V[1]
  • Phase3 Phase[1]
  • Power45 kW[1]
  • Electrical208 V, 3 Phase, 5 Wire[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the Varian Viision 80?

The Varian Viision 80 is an ion implanter.[1][4]

Not publicly documented

The following facts about the Viision 80 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Viision 80 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Viision 80 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Viision 80 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Viision 80 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Viision 80 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (4)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.comwaferpedia.com
  3. [3]iessemiconductorparts.comiessemiconductorparts.com
  4. [4]Year 2000 Activity - Product Status — vsea.com (Sep 14, 2000)web.archive.org
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Last updated Oct 21, 2026.

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