Veeco

Nexus IBE350

Etch Veeco Nexus IBE350 family

Research Quality: 40% complete

LinkedIn X Email

Nexus IBE350 — epfl.ch — Fig. 01Nexus IBE350epfl.ch^[1]

Power

1.8 MHz^[1]

Vacuum

10^-4 mbar^[1]

What is it?

The Veeco Nexus IBE350 is described as a broad-beam ion etcher that uses Argon ions extracted from an ICP source and directed through a three-grids optics system to form a mono-energetic beam for pure physical sputtering. The source states a 350 mm ion beam, energy capability from 50 V to 800 V, low-vacuum and base-pressure values, a charge neutralizer, adjustable substrate fixture tilt and rotation, and a Secondary Ions Mass Spectroscopy system for real-time endpoint detection.

What can it run?

Process applications and technology nodes documented for this tool.

Etching piezoelectric materials
Etching ferroelectric materials
Etching magnetic materials
Etching III-V materials such as GaAs, InP, GaN, and AlN
Etching ohmic metals such as Au, Pt, Cu, and Ir
Etching hard mask materials such as Ag, TiWN, and Ni
Angular etch and shape control of complex structures

What do the numbers mean?

Power & electrical4

Ion source: 350 mm diameter Argon ion source with RF plasma generator^[1]
RF plasma generator frequency: 1.8 MHz^[1]
RF plasma generator maximum power: 2 kW^[1]
Energy range: 50 V to 800 V^[1]

Vacuum & pumping2

Operating pressure: 10^-4 mbar^[1]
Base pressure: 10^-7 mbar^[1]

Wafer handling3

Substrate temperature: Less than 90 °C^[1]
Substrate rotation: Up to 10 rpm^[1]
Substrate tilt angle: +90° to -70°^[1]

Optics & imaging2

Ion optics: Three-grids collimation optics system with molybdenum electrostatic apertures^[1]
Charge neutralizer: Electron-emitting neutralizer downstream from the ion optics^[1]

Control & software1

Tilt angle control: ±0.5°^[1]

Dimensions & facilities1

Ion beam width: 350 mm^[1]

Configuration & options2

Etch type: Broad-beam ion etcher^[1]
Endpoint detection: Secondary Ions Mass Spectroscopy (SIMS) system^[1]

Interested in this tool?

Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Ion source350 mm diameter Argon ion source with RF plasma generator^[1]
RF plasma generator frequency1.8 MHz^[1]
RF plasma generator maximum power2 kW^[1]
Energy range50 V to 800 V^[1]
Operating pressure10^-4 mbar^[1]
Base pressure10^-7 mbar^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the Nexus IBE350 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Nexus IBE350 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Nexus IBE350 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Nexus IBE350 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Nexus IBE350 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Nexus IBE350 is not on record.
Answerable by: an OEM datasheet or a fab qualification report