Waferpedia

YES

G1000

Wet Processing / CleanYES G1000 family
Research Quality: 30% complete
YESG1000
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What is it?

The YES G1000 Plasma Cleaning System uses low-frequency plasma at 40 kHz for substrate cleaning and related processes. The source describes it as a plasma cleaning system with a downstream protective design, 4 powered shelves, 5 plasma modes, a touch screen interface, and a 1/2" 6061-T6 aluminum chamber.

What can it run?

Process applications and technology nodes documented for this tool.

  • Substrate cleaning
  • Substrate descum
  • Surface modification of inorganic substrates
  • Gentle cleaning of inorganic substrates
  • Cleaning of electronically sensitive devices
  • Etching
  • Surface modification prior to bonding

What do the numbers mean?

Power & electrical1

Plasma frequency
40 kHz[1]
Accurate?

Control & software2

Interface
Touch Screen Interface[1]
Accurate?
Control
State logic control of output with input monitoring[1]
Accurate?

Configuration & options6

Powered shelves
4 powered shelves[1]
Accurate?
Plasma modes
5 plasma modes: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, Downstream Ion trap[1]
Accurate?
Chamber
1/2" 6061-T6 aluminum chamber[1]
Accurate?
Process area per tray
15.13" W x 15.39" D[1]
Accurate?
Matching
Variable Frequency Matching (VFM)[1]
Accurate?
Design
Unique downstream protective design; totally charge-free plasma[1]
Accurate?
Interested in this tool?
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What replaced it?

  • siblingYES G500Listed in the same plasma cleaning systems product line.source[2]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Plasma frequency40 kHz[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the G1000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the G1000 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the G1000 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the G1000 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the G1000 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the G1000 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]pnf.uchicago.edupnf.uchicago.edupnf.uchicago.edu
  2. [2]web.archive.orgweb.archive.org
  3. [3]Yield Engineering Systems, Inc. > Products > Plasma Cleaning Systems > G Seriesyieldengineering.com (Mar 29, 2012)web.archive.org
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Last updated Jul 29, 2026.

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