Laurell
EDC-HL-8 alternatives
Comparable Spin coater equipment documented in the Waferpedia catalog.
6 comparable tools
Laurell
H6-8
200mm
Spin coater
The Laurell H6-8 is a 650-series HL spin coater that accommodates up to 200mm wafers and 7" × 7" substrates and has a maximum rotational speed of 12,000 RPM.
Laurell
WS-650-8
200mm
Spin coater
The Laurell WS-650-8B is a compact 650-series spin coater with a maximum rotational speed of 12,000 RPM and support for wafers up to 200 mm.
Laurell
400-series
150mm
Spin coater
Laurell's WS-400-6NPP is a 400-series spin coater with a 400-series process controller, a 1.75" vacuum chuck, and support for wafers up to 150 mm.
Laurell
EDC-HL-15
300mm
Spin coater
The Laurell EDC-HL-15 B is a 650-series EDC spin processor that accommodates up to 300 mm wafers and 9" × 9" substrates.
Laurell
EDC-HL-23
150mm
Spin coater
The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.
Laurell
H6-15
300mm
Spin coater
The Laurell H6-15 is a compact HL Series spin coater designed for glove box use and specified to accommodate up to ø 300mm wafers and 9" × 9" substrates.
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