Laurell

Wafer size
150mm
Produced
1995–
Power
95 to 240 VAC, 47/63 Hz, ~300 Watts[1]
Vacuum
1.75" (45 mm) diameter vacuum chuck[2]
Process applications and technology nodes documented for this tool.
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| WS-400-6NPP | — | 1995 | Described as a manual tabletop system; sources also note a 650-series replacement controller on newer models and that the 650 is not available on 6 series systems. | web.archive.org[1] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the 400-series are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the 400-series are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 400-series is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 400-series are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 400-series are on record.
Answerable by: university cleanroom staff or an OEM application specialist
The operating principle of the 400-series is not documented in this record.
Answerable by: an equipment physicist or OEM application engineer
Last updated Jul 29, 2026.
The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.
The Laurell H6-23 is a compact HL Series spin coater for wafers and substrates, with a maximum rotational speed of 12,000 RPM.
The Laurell Lz-23 B is a compact 650-series spin coater that accommodates up to 150 mm wafers and 5 in × 5 in substrates.
The Laurell WS-650 is a spin coater used for spincoating photoresists.