Waferpedia

Laurell

EDC-HL-8

Spin coater200mmLaurell EDC-HL-8 family
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EDC-HL-8 — web.archive.org
Fig. 01EDC-HL-8web.archive.org[1]

Wafer size

200mm

Power

95 to 240 VAC, 47/63 HZ, ~300 Watts[1]

Vacuum

12,000 RPM with vacuum hold-down[1]

What is it?

The EDC-HL-8 B is part of Laurell's 650-series EDC spin processor line and is described as a compact system with advanced features. The source states that it accommodates up to 200 mm wafers and 7 in × 7 in (178 mm × 178 mm) substrates, with a 12,000 RPM capability using vacuum hold-down but a recommendation for only 3,000 RPM and non-vacuum chucks.

What can it run?

Process applications and technology nodes documented for this tool.

  • Etch
  • Develop
  • Clean
  • solvent or aqueous rinse

What do the numbers mean?

Power & electrical1

Power
95 to 240 VAC, 47/63 HZ, ~300 Watts[1]
Accurate?

Vacuum & pumping4

Maximum speed capability
12,000 RPM with vacuum hold-down[1]
Accurate?
Recommended speed
3,000 RPM with non-vacuum chucks[1]
Accurate?
Nitrogen/CDA pressure
60–70 PSIG (4–5 bar)[1]
Accurate?
Vacuum requirement
25–28 inches Hg; 4.5 SCFM at 0 inches Hg[1]
Accurate?

Wafer handling2

Maximum wafer size
up to 200 mm[1]
Accurate?
Maximum substrate size
7 in × 7 in (178 mm × 178 mm)[1]
Accurate?

Configuration & options1

Series
650-series EDC system[1]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
EDC-HL-8 B——Described as the EDC-HL-8 B spin processor model; no other changes relative to a base model are stated in the source.web.archive.org[1]
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Maximum speed capability12,000 RPM with vacuum hold-down[1]
  • Recommended speed3,000 RPM with non-vacuum chucks[1]
  • Power95 to 240 VAC, 47/63 HZ, ~300 Watts[1]
  • Nitrogen/CDA pressure60–70 PSIG (4–5 bar)[1]
  • Vacuum requirement25–28 inches Hg; 4.5 SCFM at 0 inches Hg[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the EDC-HL-8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-HL-8 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the EDC-HL-8 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EDC-HL-8 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EDC-HL-8 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the EDC-HL-8 are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]web.archive.org — web.archive.orgweb.archive.org
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Last updated Jul 29, 2026.

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