Tegal
6520 alternatives
Comparable Etch equipment documented in the Waferpedia catalog.
6 comparable tools
Tegal
6510
100mm
Etch
The Tegal 6510 is a high-density CCP plasma etch tool with dual-frequency RF power application and magnetic plasma confinement.
Tegal
6540
100mm
Etch
The Tegal 6540 is a high-density plasma etch system used for etching difficult-to-etch materials in MEMS and related semiconductor applications.
Tegal
6550
100mm
Etch
The Tegal 6550 is a plasma etch reactor/system for etching non-volatile metal and metal oxide films, with a dual-chamber platform and patented rinse-strip-rinse capability.
Plasma-Therm
770
100mm
Etch
The Plasma-Therm 770 SLR series is an inductively coupled plasma (ICP) etch system used for dry etching of materials such as silicon, SiO₂, Si₃N₄, and compound semiconductors.
Tegal
900
100mm
Etch
The Tegal 900 is a plasma etch system used for applications including defreckling, backside nitride etching, and processing III-V materials.
Tegal
903
100mm
Etch
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