Waferpedia

Tegal

6520

Etch100mmIntroduced Produced 2001–Tegal 6520 family
Research Quality: 40% complete
6520 — web.archive.org
Fig. 016520web.archive.org[2]

Wafer size

100mm

Produced

2001–

Power

dual-frequency RF power application[3]

What is it?

The Tegal 6520 HRe is described as a high-density CCP plasma etch tool with dual-frequency RF power application and magnetic plasma confinement. Sources cite applications including sub-micron aluminum alloy interconnect stack etch, anisotropic thick aluminum alloy interconnect etch, and HBT/HEMT gate mesa and recess etch. One source states wafer size support of 100mm to 200mm.

What can it run?

Process applications and technology nodes documented for this tool.

  • sub-micron aluminum alloy interconnect stack etch
  • anisotropic thick (>2 micron) aluminum alloy interconnect etch
  • HBT/HEMT gate mesa and recess etch
  • gallium arsenide (GaAs) etching in the production of telecom devices
  • other III-V material etch applications

What do the numbers mean?

Power & electrical1

RF power
dual-frequency RF power application[3]
Accurate?

Wafer handling1

Wafer size
100mm – 200mm[3]
Accurate?

Configuration & options4

Tool type
high-density CCP plasma etch tool[3]
Accurate?
Plasma confinement
magnetic plasma confinement[3]
Accurate?
Process capability
Rinse-Strip-Rinse (RSR)[2]
Accurate?
Process capability
etch-rinse-strip-rinse (E-R-S-R)[1]
Accurate?

Vintage & configurations

  1. 2001Production start[1]

    A Tegal 6520 high-density plasma etch system was ordered and scheduled for installation in June 2001.

  2. 2001-02-13Order announcement[1]

    A source states that an order for a Tegal 6520 high-density plasma etch system was announced on 13 February 2001.

Interested in this tool?
Embed spec card

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • RF powerdual-frequency RF power application[3]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Not publicly documented

The following facts about the 6520 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented variants, configuration options, or revision breakpoints of the 6520 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 6520 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 6520 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 6520 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the 6520 are on record.

    Answerable by: an OEM parts catalog or a service engineer

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.orgweb.archive.org
Was this page accurate?

Last updated Jul 29, 2026.

Compare with similar tools

View all →