Tegal
Wafer size
100mm
Introduced
2000
Process applications and technology nodes documented for this tool.
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 6550 Spectra | — | 2000 | Described as the 6550 Spectra etch reactor/system with Spectra plasma source, dual-chamber platform, and rinse-strip-rinse capability. | web.archive.org[3] |
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The following facts about the 6550 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the 6550 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 6550 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 6550 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 6550 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
The operating principle of the 6550 is not documented in this record.
Answerable by: an equipment physicist or OEM application engineer
Last updated Jul 29, 2026.
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