Applied Materials
VIISta HCP+
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Applied Materials / Varian VIISta HCP+ is a high current ion implanter. Applied Materials / Varian VIISta HCP+ is configured for 12-inch wafer processing. Applied Materials / Varian VIISta HCP+ is configured for 300 mm wafer processing.[1][2][3]
What it is
How it works
General reference — not yet source-verifiedIon implanters introduce dopant atoms into semiconductor wafers by generating ions, forming a beam, selecting the desired species, and directing the beam onto the wafer surface. High current ion implanters are used when a process calls for substantial dopant dose delivery across patterned wafer regions.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is a front-end semiconductor process used after pattern definition to modify the electrical properties of exposed regions of a wafer. Ion implantation is followed by annealing to activate dopants and repair lattice damage caused by the implant.
Applications
What do the numbers mean?
Wafer handling2
Configuration & options5
- High Current[3]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Varian Viision 200— Same function class: Ion Implantation, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the VIISta HCP+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta HCP+ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta HCP+ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta HCP+ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta HCP+ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta HCP+ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]inventory listing
- [4]Applied Materials Varian VIISta HCP+ High Current Implanter for sale — fabsurplus.comfabsurplus.com
Last updated Oct 19, 2026.
Compare with similar tools
View all →
The Varian Viision 200 (also spelled VIISion 200) is a batch-process, high-current ion implanter for 200 mm wafers, introduced in 1996.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
