AJA

A300-XP

Research Quality: 40% complete

What is it?

The sources are described as the next generation, expanded-performance version of the A300 series magnetron sputtering sources. The source family includes circular and rectangular versions, and the sources are said to support features such as higher pressure operation, improved magnetic material sputtering performance, and a larger product range.

What can it run?

Process applications and technology nodes documented for this tool.

Semiconductor
Conductive metal, resistive metal, and insulating films
Transparent electrical conductors
Optical communications applications
Wear resistant films
Lens coatings
Precious metals
Thin film sensors
Coatings for surgical/medical implements and implants
Magnetic storage media and heads
Photovoltaic thin films

What do the numbers mean?

Vacuum & pumping1

Stated improvements: Higher pressure operation, improved magnetic material sputtering performance, and a larger product range^[1]

Wafer handling1

A330-XP substrate orientation example: Con-focal orientation for uniform deposition onto 150 mm diameter substrates^[1]

Configuration & options3

Source family: A300-XP UHV magnetron sputtering sources^[1]
Description: Next generation, "expanded performance" version of the A300 series^[1]
Variant examples mentioned: A320-XP, A330-XP, A340-XP^[1]

Vintage & configurations

Documented models & variants

Designation	Generation	Vintage	Changes	Source
A320-XP	—	—	Typical 2" UHV source with in-situ tilt, pneumatic shutter, gas ring, conical chimney, and integral gas injection.	web.archive.org^[1]
A330-XP	—	—	UHV magnetron sputter source with in-situ tilt shown in a con-focal orientation for uniform deposition onto 150 mm diameter substrates.	web.archive.org^[1]
A340-XP	—	—	4" target UHV magnetron sputtering source on 8" CF rotatable flange with chimney, gas ring, and pneumatic shutter.	web.archive.org^[1]

Interested in this tool?

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What replaced it?

siblingAJA A3CV— The A3CV series is described alongside the A300-XP series and as featuring the same modular magnet array.source^[1]

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

Stated improvementsHigher pressure operation, improved magnetic material sputtering performance, and a larger product range^[1]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Not publicly documented

The following facts about the A300-XP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the A300-XP are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the A300-XP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the A300-XP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the A300-XP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the A300-XP are on record.
Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (3)Every fact above is drawn from these public sources

[1]web.archive.org — web.archive.orgweb.archive.org
[2]Batch Coating Sputtering Systems - AJA International, Inc. — web.archive.orgweb.archive.org
[3]HV R&D SPUTTERING SOURCES: STILETTO SERIES - AJA International — web.archive.orgweb.archive.org