Applied Materials
Centura 5200 ES MxP Poly
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Applied Materials Centura 5200 ES MxP Poly is an etch system. The Applied Materials Centura 5200 ES MxP Poly handles 8-inch wafers and processes poly-silicon on 2 channels (CH-A/B).[1]
What it is
General reference — not yet source-verifiedThe Centura 5200 ES MxP Poly is a single-wafer, multi-chamber plasma etch system built on the Applied Materials Centura cluster-tool platform.
How it works
General reference — not yet source-verifiedThe Centura platform uses a central transfer robot that moves wafers between a loadlock and multiple process chambers under vacuum. Each chamber performs plasma-assisted reactive ion etch (RIE) using process gases tailored to the material being etched. For polysilicon etching, chlorine- or fluorine-based chemistries are typically used in a high-density plasma environment.
Where it fits in the process flow
General reference — not yet source-verifiedPolysilicon etching is a critical step in the fabrication of CMOS gates and memory wordlines. In the fab flow, the poly etch step follows polysilicon deposition and patterning by photolithography. After etching, the resist is stripped and subsequent steps may include spacer deposition or salicidation.
What do the numbers mean?
Wafer handling1
Configuration & options3
- 2ch: Poly-si CH-A/B[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Centura 5200 ES MxP Poly are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura 5200 ES MxP Poly are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura 5200 ES MxP Poly are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura 5200 ES MxP Poly are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura 5200 ES MxP Poly are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura 5200 ES MxP Poly is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]inventory listing
Last updated Aug 23, 2026.