PAS5500/80

The ASML PAS5500/80 is a lithography stepper. The ASML PAS5500/80 provides automatic alignment and exposure of photoresist films. The ASML PAS5500/80 exposes with resolution down to 500 nm.^[1][2]

The ASML PAS5500/80 exposes one die at a time with i-line or 365 nm UV light before stepping to the next die. The ASML PAS5500/80 forms the exposed image by transmitting UV light through a patterned chrome layer on a quartz reticle or photomask. The ASML PAS5500/80 uses projection optics with 5X image scale reduction, so the image on the wafer is smaller than the pattern on the reticle.^[2]

Lithography steppers operate in the patterning portion of wafer fabrication after resist coating and soft bake. Lithography steppers are used before resist development and before pattern transfer steps such as etch, implantation, or lift-off. Lithography steppers are part of the repeated cycle by which successive patterned layers are aligned and exposed across a wafer.

The ASML PAS5500/80 accepts standard substrates of 4 inch wafers and is technically configurable for 6 inch and 8 inch wafers. The ASML PAS5500/80 accepts substrate thickness from 300 µm to 1000 µm. The ASML PAS5500/80 offers backside alignment through 3DAlign. The ASML PAS5500/80 supports multi-step imaging with focus offset up to ±200 µm. The ASML PAS5500/80 can use carrier wafers when wafers have through-etched features or deep backside cavities.^[2]