Axcelis
The Axcelis NV GSD HE is an ion implantation system. The Axcelis NV GSD HE can handle 6-inch wafers and can be converted to handle 8-inch wafers. The Axcelis NV GSD HE configuration includes an end station, disk module, final energy magnet, linac module, gas box, and source.[1][2][3]

Wafer size
8"
Power
High voltage power supply[1]
Vacuum
Both front and rear Cyro pumps by the OEM[1]
Gas delivery
All gas box elements[1]
The Axcelis NV GSD HE is an ion implantation system.[2]
Ion implantation is used to introduce controlled dopant species into semiconductor wafers.
The NV GSD HE is a mature-node wafer implantation tool class suited to semiconductor device fabrication on silicon wafers.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The following facts about the NV GSD HE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NV GSD HE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NV GSD HE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NV GSD HE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NV GSD HE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NV GSD HE is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 4, 2026.