Hitachi
S 9220 CD-SEM
The Hitachi S 9220 CD-SEM is a critical dimension scanning electron microscope used for length measurement of semiconductor features. The Hitachi S 9220 CD-SEM offers a measuring range of 0.1 μm to 2.0 μm and a throughput of 56 wafers per hour. The Hitachi S 9220 CD-SEM achieves a secondary electron image resolution of 3 nm at an acceleration voltage of 0.8 kV.[1][2]
Wafer size
Wafer Transfer Robot:
Power
208 V, 60 Hz[3]
Vacuum
Fully automatic dry clean exhaust system[1]
Performance
40k-150k-200k times[1]
Optics
± 1% or 3 nm (3σ) larger value[1]
What it is
General reference — not yet source-verifiedA CD-SEM is a metrology and inspection tool used to measure patterned feature dimensions on semiconductor wafers. A CD-SEM commonly supports process control by checking whether printed or etched structures match target dimensions.
How it works
The Hitachi S 9220 uses an electromagnetic lens system with a booster stock lens. The Hitachi S 9220 uses a scintillator and photomultiplier detector with an EXB filter for 2 stage detection of secondary electron and backscattered electron images. The Hitachi S 9220 provides acceleration voltage from 500 to 1600 V in 10 V steps. The Hitachi S 9220 provides secondary electron image resolution of 3 nm at an acceleration voltage of 0.8 kV.[1][2][8]
Where it fits in the process flow
General reference — not yet source-verifiedA CD-SEM typically sits in the metrology loop around patterning steps in wafer fabrication. A CD-SEM is commonly used after lithography and after etch to verify that critical dimensions remain within process targets before downstream pattern transfer or integration continues.
Applications
The Hitachi S 9220 is used for length measurement of semiconductor features. The Hitachi S 9220 supports automatic wafer transfer by wafer transfer robot, with random access for 2 cassettes, vacuum suction chucking on the back side of the wafer, and automatic optical detection of OF and V-notch orientation features.[1][2][8]
What do the numbers mean?
Power & electrical10
- Single Phase[3]
Vacuum & pumping6
- Loader System
- Automatic transfer by wafer transfer robot; random access type for 2 cassettes; vacuum suction chucking on back side; automatic OF/V-notch detection by optical sensor[1]
- Vacuum Exhaust System
- Fully automatic dry clean exhaust system; 3 ion pumps, two turbo molecular pumps, 2 dry pumps (supplied)[1]
- Safety Functions
- Protection function in the event of a power outage; AIR pressure drop; cooling water flow rate drop (self) with dynamic valve closing function; pump stop function[1]
Wafer handling12
- Loader System:[1]
Optics & imaging15
- For magnification exceeding 150k times, the effect of electron beam irradiation shall be excluded[1]
- Image Magnification:[1]
- Detection System
- Scintillator / photomultiplier detector using EXB filter; 2 stage detection method for SE and BSE images[1]
- Optical Microscope
- Approximately 1.2 mm square field of view, with black and white CCD camera[1]
Performance1
Control & software6
Configuration & options28
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Power Supply208 V, 60 Hz[3]
- ConfigurationSingle Phase[3]
- Secondary Electron Image Resolution3 nm (acceleration voltage 0.8 kV)[1]
- Voltage100V[6]
- Frequency60 Hz[7]
- Loader SystemAutomatic transfer by wafer transfer robot; random access type for 2 cassettes; vacuum suction chucking on back side; automatic OF/V-notch detection by optical sensor[1]
- Acceleration Voltage500 to 1600 V (variable in 10 V steps)[1]
- Vacuum Exhaust SystemFully automatic dry clean exhaust system; 3 ion pumps, two turbo molecular pumps, 2 dry pumps (supplied)[1]
- Safety FunctionsProtection function in the event of a power outage; AIR pressure drop; cooling water flow rate drop (self) with dynamic valve closing function; pump stop function[1]
- Power Supply (208V variant)208 V, 60 Hz, Single Phase[3]
- Power Supply (100V variant)100V, 60 Hz, Single Phase, 6kVA[6]
- Power Supply (200V variant)200V, 60 Hz, Single Phase[7]
- Chucking MethodVacuum suction on the back side of the wafer[1]
- Acceleration voltage500 to 1600 V in 10 V steps[1]
- Vacuum exhaust systemFully automatic dry clean exhaust system[1]
- Vacuum pump configuration3 ion pumps, two turbo molecular pumps, 2 dry pumps[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the S 9220 CD-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 9220 CD-SEM are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 9220 CD-SEM are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 9220 CD-SEM are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the S 9220 CD-SEM are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the S 9220 CD-SEM is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]inventory listing
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]inventory listing
- [7]inventory listing
- [8]S 9220 CD-SEM — Hitachi | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Oct 17, 2026.
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