Nikon
L 200 N
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Wafer size
w/ TH 200 Wafer Loader
Optics
Exceptional precise optical inspection[2]
What it is
The L 200 N is a reflected-light instrument for inspection work on semiconductor and related industrial substrates. The model supports integration with a wafer loader for wafer inspection tasks.[2]
How it works
The L 200 N uses optical microscopy to inspect surfaces and patterns at high precision. The microscope supports brightfield, darkfield, polarizing, differential interference contrast, and epi-fluorescence observation modes.[2]
The L 200 N uses a reflected-light optical path and can be configured with a motorized universal sextuple nosepiece. The microscope provides fine focus and stage motion controls for precise manual inspection work.[2]
Where it fits in the process flow
The L 200 N can support inspection of bare wafers and low-contrast samples. The microscope's focusing and contrast methods are intended to make alignment, feature review, and surface inspection more practical on production materials.[2]
Applications
The L 200 N is used for inspection of integrated circuits, flat panel displays, large scale integration electronic devices, wafers, reticles, and other substrates. The model is also positioned for semiconductor and photovoltaic device inspection.[2]
What do the numbers mean?
Wafer handling8
- Inspection use
- Inspection of integrated circuits, flat panel displays, large scale integration electronic devices, wafers, and other substrates[2]
- Supported applications
- Inspection of integrated circuits (IC), flat panel displays (FPD), large scale integration (LSI) electronic devices, wafers, reticules, and other substrates[2]
Optics & imaging1
Configuration & options4
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| L300N | — | — | The L300N series is for 300 mm wafers. | industry.nikon.com[2] |
| L200ND | — | — | The L200ND includes episcopic/diascopic illumination and motorized control for nosepiece, light intensity control, aperture diaphragm control, and episcopic/diascopic change-over. | industry.nikon.com[2] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size is the Nikon L 200 N series specified for?
The Nikon L 200 N series is specified for 200 mm wafers.[2]
What observation methods does the Nikon L 200 N support?
The Nikon L 200 N supports brightfield, darkfield, simple polarizing, differential interference contrast, and epi-fluorescence in reflected-light observation.[2]
Can the Nikon L 200 N be integrated with a wafer loader?
The Nikon L 200 N can be integrated with the NWL200 wafer loader.[2]
What control functions are motorized on the Nikon L 200 N?
The Nikon L 200 N provides motorized control for the nosepiece, light intensity, and aperture diaphragm.[2]
Does the Nikon L 200 N support software-connected microscope control?
The Nikon L 200 N detects and controls the objective lens in use, light intensity, episcopic illumination, and aperture through a USB connection to NIS-Elements software.[2]
Not publicly documented
The following facts about the L 200 N are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the L 200 N are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the L 200 N are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the L 200 N are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the L 200 N is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the L 200 N are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]industry.nikon.com — industry.nikon.comindustry.nikon.com
Last updated Oct 16, 2026.
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