Nikon
NSR 2005 i 10 C i-Line
What it is
How it works
General reference — not yet source-verifiedA lithography stepper transfers a pattern from a mask onto a photoresist-coated wafer by exposing the wafer field in a controlled optical projection system.
A stepper is used to print repeated circuit patterns across a wafer by stepping from field to field after each exposure.
Where it fits in the process flow
General reference — not yet source-verifiedA lithography stepper sits in the pattern-transfer stage of semiconductor fabrication.
A lithography stepper operates after wafer preparation and photoresist coating and before resist development and the downstream pattern transfer steps that follow exposure.
Applications
General reference — not yet source-verifiedA lithography stepper is used for circuit patterning on semiconductor wafers.
A lithography stepper is used in wafer fabrication where repeated exposure of resist defines device features across the substrate.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Not able to produce wafers as-is
- Heavy water damage
- No wafer handler
What do the numbers mean?
Power & electrical1
Vacuum & pumping2
- Vacuum[1]
Wafer handling12
Control & software1
Dimensions & facilities1
Configuration & options13
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the NSR 2005 i 10 C i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the NSR 2005 i 10 C i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the NSR 2005 i 10 C i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR 2005 i 10 C i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the NSR 2005 i 10 C i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR 2005 i 10 C i-Line are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Inventory photo
Last updated Oct 13, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.