Nikon
NSR 2205 i 12 D i-Line
What it is
How it works
General reference — not yet source-verifiedA mask aligner or stepper in photolithography transfers a patterned image from a mask or reticle onto a photosensitive wafer surface using controlled exposure.
A stepper exposes the wafer field by field, and the wafer is processed through resist coating and later development and pattern transfer steps in the lithography flow.
Where it fits in the process flow
The Nikon NSR 2205 i 12 D i-Line sits in the photolithography module of semiconductor manufacturing.[1]
Applications
The Nikon NSR 2205 i 12 D i-Line is used for photolithographic patterning on semiconductor wafers.[1]
What do the numbers mean?
Power & electrical2
Wafer handling13
- Vax Station, Pin Chuck[1]
Performance2
Control & software1
Dimensions & facilities1
Configuration & options21
Vintage & configurations
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Canon FPA 2500 i 3 i-Line— Same function class: Lithography, nullCompare in depthsource[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the NSR 2205 i 12 D i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the NSR 2205 i 12 D i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the NSR 2205 i 12 D i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the NSR 2205 i 12 D i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the NSR 2205 i 12 D i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the NSR 2205 i 12 D i-Line are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (9)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Equipment inventory listing
- [3]Inventory photo
- [4]Inventory photo
- [5]Inventory photo
- [6]Inventory photo
- [7]Equipment inventory listing
- [8]Equipment inventory listing
- [9]Equipment inventory listing
Last updated Oct 12, 2026.
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The Canon FPA 2500 i 3 is an i-line stepper for 8-inch wafers with a 5-inch reticle.
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.