Onto Innovation
IVS 280 System
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Onto Innovation IVS 280 System is a semiconductor metrology tool. The IVS 280 System measures overlay, critical dimension (CD), and height on 100mm to 200mm wafers, targeting compound semiconductor, power device, RF, MEMS, and LED markets.[1]
What it is
The Onto Innovation IVS 280 System is a metrology and inspection system.[1]
The IVS 280 System provides overlay, critical dimension, and height metrology for 100mm-200mm wafers.[1]
How it works
The IVS 280 System belongs to the optical metrology class used to measure overlay, critical dimensions, and height on wafers.[1]
Where it fits in the process flow
The IVS 280 System serves compound semiconductor, power device, RF, MEMS, and LED manufacturing.[1]
Applications
The IVS 280 System is used for overlay, critical dimension, and height metrology.[1]
The IVS 280 System is applied in compound semiconductor, power device, RF, MEMS, and LED markets.[1]
- compound semiconductors
- power devices
- MEMS
What do the numbers mean?
Wafer handling1
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What measurements does the IVS 280 System perform?
The IVS 280 System performs overlay, critical dimension, and height metrology.[1]
What wafer sizes does the IVS 280 System support?
The IVS 280 System is specified for 100mm-200mm wafers.[1]
Which markets use the IVS 280 System?
The IVS 280 System serves compound semiconductor, power device, RF, MEMS, and LED markets.[1]
Not publicly documented
The following facts about the IVS 280 System are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the IVS 280 System are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the IVS 280 System are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the IVS 280 System are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the IVS 280 System are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the IVS 280 System are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]ontoinnovation.com — ontoinnovation.comontoinnovation.com
Last updated Oct 7, 2026.
Compare with similar tools
View all →The KLA .204 PSL Wafer is an 8-inch NIST-traceable reference wafer compatible with Surfscan 6xy0 and Sp1 particle counters.
KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.
