WaferView 210 Auto Macro

The Onto Innovation WaferView 210 Auto Macro is a wafer inspection and metrology system in the macro inspection class. Macro inspection systems examine wafer surfaces and patterned areas for visible defects, process excursions, and overall condition at a field of view larger than high-magnification review tools.^[1]

Macro inspection systems generally image the wafer surface with optical hardware and automated handling, then present or evaluate wafer-scale views for inspection. Auto macro tools typically combine wafer movement, image acquisition, and review functions so patterned or unpatterned wafers can be checked for surface issues across large areas.

Macro wafer inspection fits between manufacturing steps where rapid visual screening of wafer condition is useful. Macro inspection is commonly used after deposition, lithography, etch, clean, or other pattern-forming operations to catch scratches, stains, particles, edge issues, and other process-visible defects before subsequent processing or detailed review.

Macro inspection systems are applied to in-line defect monitoring, process excursion detection, and disposition support for semiconductor wafers. Macro inspection can support engineering analysis and production screening by highlighting wafers or areas that may need rework, hold, or follow-on review on higher magnification inspection tools.