Plasma-Therm
790
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Power
water cooled RF platen[3]
Vacuum
10 mTorr to 100 mTorr[3]
Gas delivery
Chemical Vapor Deposition (CVD)[1]
What is it?
Applications
Typical application areas include microelectromechanical systems (MEMS), photonics, solid-state lighting, and failure or yield analysis. The system is suitable for processing substrates for prototyping, pilot lines, and low-volume production.[2]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Etching of organic substances is prohibited in one facility listing.
- The tool is reserved for silicon, silicon nitride, and silicon dioxide in one facility listing.
What do the numbers mean?
Power & electrical3
Vacuum & pumping2
Wafer handling3
Gas & chemistry5
Configuration & options10
- Archived series reference
- formerly Plasma-Therm 790+ series open-load etch and deposition systems[2]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| 790+ | — | — | Predecessor to Advanced Vacuum Vision 300 and 400 open-load etch and deposition systems. | web.archive.org[2] |
| Plasma-Therm 790 MF | — | — | described as a stand-alone RIE system with showerhead gas distribution and a water cooled RF platen | mrl.illinois.edu[3] |
| PlasmaTherm 790 RIE | — | — | described as a reactive ion etcher configured for silicon substrate processing and manually loaded substrates up to 8 inches in diameter | research.engineering.ucdavis.edu[6] |
| PlasmaTherm 790 | — | — | described as a parallel plate plasma etching system for silicon nitride thin films | nist.gov[5] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- CategoryChemical Vapor Deposition (CVD)[1]
- Gas distributionshowerhead gas distribution[3]
- Platenwater cooled RF platen[3]
- RF power500 W, 13.56 MHz[3]
- RF power rangeup to 500 W at 13.56 MHz[5]
- Pressure range10 mTorr to 100 mTorr[3]
- Pressure rangeless than 900 mTorr[4]
- Process gasesCF4, CHF3, SF6, and O2[3]
- Process gasesAr, O2, CF4, CHF3, N2, and SF6[5]
- Process gasesSF6, CHF3, CF4, O2, and Ar[4]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the 790 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 790 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 790 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 790 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 790 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 790 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]wiki.nanotech.ucsb.edu — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [2]web.archive.org — web.archive.orgweb.archive.org
- [3]mrl.illinois.edu — mrl.illinois.edumrl.illinois.edu
- [4]cores.research.asu.educores.research.asu.edu
- [5]nist.gov — nist.govnist.gov
- [6]research.engineering.ucdavis.edu — research.engineering.ucdavis.eduresearch.engineering.ucdavis.edu
- [7]Tool List - UCSB Nanofab Wiki — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [8]Tool List - UCSB Nanofab Wiki — wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
Last updated Oct 20, 2026.
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